Used AMAT / APPLIED MATERIALS Carina Mesa #9251127 for sale
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ID: 9251127
Wafer Size: 12"
Vintage: 2012
Etcher, 12"
EFEM
TM Module
Chamber B
Axiom chamber D
AC Rack
Accessories included
2012 vintage.
AMAT / APPLIED MATERIALS Carina Mesa reactor is a fully automated deposition equipment designed to enable high-quality thin film deposition onto a wide range of surfaces. AMAT Carina Mesa is a two-zone, high-efficiency, or HIEEP, reactor, a hybrid type of CVD process. This system is capable of depositing a variety of materials, including metals, oxides, and nitrides, at temperatures up to 1000C. The two-zone design helps maximize efficiency, as it allows for the introduction of new reactants in the first zone without the need to shut down the unit. APPLIED MATERIALS Carina Mesa reactor can be operated in a continuous fashion, meaning that reactants can be loaded and unloaded while the machine is running, allowing for greater throughput and increased process stability. Carina Mesa reactor is equipped with a variety of advanced process controls such as temperature monitoring, pressure monitoring, reactive gas flow control, and automated recipe control. Advanced process diagnostics, such as RIE/ICP etching and in-situ sheet resistance measurements, can also be utilized with this tool. This allows for greater process optimization and reproducibility. AMAT / APPLIED MATERIALS Carina Mesa reactor is also equipped with a number of safety features, including the ability to monitor temperature, pressure, gas flows, and numerous other factors. The asset also has an emergency shutoff switch and accompanying alarms for quick reaction in case of any dangerous situations. Overall, AMAT Carina Mesa is a state-of-the-art deposition reactor, capable of depositing high-quality thin films at precise temperatures with exceptional reproducibility. Its two-zone design and automation capabilities ensure high throughputs and optimal process stability, while its advanced process controls and safety features further make this model the perfect choice for any deposition task.
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