Used AMAT / APPLIED MATERIALS Carina #9240272 for sale

AMAT (APPLIED MATERIALS) AMAT / APPLIED MATERIALS Carina reactor is an advanced deposition equipment designed for use in semiconductor fabrication. The system utilizes physical vapor deposition (PVD) and chemical vapor deposition (CVD) technologies to deposit films on substrates in a precise and delicate manner. AMAT Carina reactor offers benefits in terms of throughput, uniformity, and overall performance, making it an ideal choice for a wide range of fabrication applications. The unit employs a highly efficient, modular two-part deposition chamber, which allows for both PVD and CVD processes to occur in a single deposition step. The bottom part is known as the deposition chamber, and contains the sources, substrates, and target materials, while the top part consists of the vacuum vessel. The deposition chamber is equipped with three sources, including an ion shower chamber, a sputtering source, and an electron beam source, which can be individually driven by a power supply. The machine also features a closed-cell source configuration for CVD processing and gas manifolds for inert gas delivery. The deposition chamber is mounted or installed on a vibration-isolated, air-cooled lift platform, which allows for quick and easy loading and unloading of substrates. It is also equipped with an adjustable substrate heater, which provides adjustable temperature control for precise and high-quality results. APPLIED MATERIALS Carina reactor also features a sophisticated vacuum tool, which provides a precise and stable environment for the deposition process. It is designed to maintain a low pressure environment, and is equipped with an array of pressure safety valves and sensors to monitor and regulate the chamber pressure as well as the substrate temperature during the process. The asset also comes with a variety of controllers and sensors, which facilitate monitoring and real-time control during deposition. It is also designed with advanced diagnostics and feedback algorithms, which help ensure process quality and consistency. Overall, Carina is a high-precision deposition model that provides the ultimate in performance and throughput when it comes to complex semiconductor fabrication processes. With its advanced features, it is the ideal choice for semiconductor fabrication applications that demand extremely precise and uniform results.