Used AMAT / APPLIED MATERIALS Centura 4.0 Radiance #9260521 for sale

AMAT Centura 4.0 Radiance reactor is a plasma-based reactor designed for advanced semiconductor applications. This highly flexible, low-pressure single-wafer reactor is designed to process a variety of materials, including silicon, germanium, indium-based and several compound semiconductor materials. The versatile Centura 4.0 Radiance reactor allows for a variety of process sequences, especially for advanced transistor, IC, and heterogeneous memory applications. Its plasma is generated from a radio frequency (RF) source, with argon, oxygen, or nitrogen gas providing the plasma-energizing electrons. The reactor also enables the introduction of dopants during the etching process using a gas phase delivery system. The Centura 4.0 Radiance is designed with large chambers and wider wafer areas, allowing for low pressure etching and deposition of larger areas of material, while also achieving better uniformity compared with standard rate etching processes. This is due to its ability to use faster-moving ions, a higher ion-to-neutral gas ratio, and reduction of ion collisions for more efficient low-pressure etching. The Centura 4.0 Radiance is also equipped with APPLIED MATERIALS patented Plasma Assisted End-Point Control (PEPC™) system which optimizes the end-point detection for accurate etching, enabling a quick response to real-time process changes. Its embedded dedicated end-point technology allows for continuous etching, maximizing the process yield and increasing the throughput of devices significantly faster than with conventional plasma etching simulation systems. The Centura 4.0 Radiance reactor is designed for cost effective production of devices, utilizing its generous process options such as contact alignment, wafer chuck cleaning, low pressure etching, dynamic pressure control, and wafer-to-substrate alignment. It provides several advantages over standard etchant solutions, including increased wafer uniformity, higher etch rates, and reduced etch bias. Overall, the Centura 4.0 Radiance is a powerful, versatile tool for semiconductor fabrication and advanced device processing. With its robust design and comprehensive functionality, it is ideal for today's demanding device development challenges.