Used AMAT / APPLIED MATERIALS Centura 4.0 #293820596 for sale

ID: 293820596
Plasma system.
AMAT Centura 4.0 reactor is a state-of-the-art high-throughput deposition machine designed for processing a wide range of materials. This reactor is designed to enable fast, efficient and cost-effective manufacturing of complex devices such as semiconductor integrated circuits and optoelectronic components. The Centura 4.0 is configured with a fully automated process control equipment, allowing operators to continuously monitor wafer processing and reduce downtime. With the chamber flagging feature, settings can be adjusted remotely from a laptop or a remote location via Ethernet connection. The temperature controller permits temperature tunability within the range of 200° C to 400° C, allowing for deposition characteristics to be tailored to the desired results for each individual processing run. Substrate cooling is also available to reduce substrate surface temperatures (Tm). The Centura 4.0 reactor's load lock system automatically evacuates the process chamber and maintains a clean environment inside the reactor chamber during process cycles, ensuring consistent film deposition from wafer to wafer. Customized gas box configurations are also available to facilitate gas flow optimization and uniform gas distribution. In addition, the reactor utilizes a full suite of in-situ monitoring tools such as reflectometer and quartz crystal monitoring, enabling the operater to monitor process conditions in real time. The reactor is equipped with a polymer grown deposition (PGD) feature that provides unprecedented control of epitaxial growth in the production process. The action of a specialized deposition source, in combination with pulsed substrate pulses, results in film properties that cannot be achieved with other processing methods. The Centura 4.0 also offers a built-in particle control unit that continuously monitors, detects, and eliminates particles while depositing. This machine can detect and ensure process stability during deposition. Overall, APPLIED MATERIALS Centura 4.0 reactor is a next-generation machine designed to minimize production costs and maximize production capacity. With its advanced process control and full range of deposition process capabilities, this machine is the ideal tool for high-throughput deposition and device fabrication.
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