Used AMAT / APPLIED MATERIALS Centura 5200 ACL #9200079 for sale

AMAT AMAT / APPLIED MATERIALS Centura 5200 ACL is an advanced semiconductor processing reactor specifically designed to provide high-performance plasma etch applications. This high-performance tool provides excellent etch uniformity, selectivity, and consistency. The tool was developed to enable cost-effective fabrication of complex structures with small critical dimensions. AMAT Centura 5200 ACL was engineered with a single-wafer, multi-chamber plasma etch reactor. This reactor's design incorporates a patented, low-inductance field-coupled plasma (FCP) source that produces a more uniform plasma throughout the entire process chamber. This provides the tool with exceptional etching uniformity and repeatability. Additionally, the machine also utilizes a uniform bimodal electron cyclotron resonance (ECR) source for a more accurate, consistent, and repeatable plasma etch process. APPLIED MATERIALS Centura 5200 ACL also supports one-step etching, which eliminates the need for multiple etch processes. This allows for faster, more reliable, and economic production. The midplate of the reactor also includes an advanced temperature control system to ensure ultra-fine temperature control. This allows for highly precise plasma etch processes. The low-inductance FCP plasma source also allows the tool to be configured to run HBr, Cl2 and SF6 processes, which offers further supports to wide range of processes on the same tool. Centura 5200 ACL is built with a compact design featuring a conveniently partitioned chamber with two isolation valves, a single pumping system, and a common gas panel. This makes the tool relatively simple to install and maintain, which is ideal for fast, low-maintenance production. The reactor also incorporates a top-level diagnostics package with advanced hardware and software that allow greater control and monitoring of the plasma etch. This ensures a dependable and repeatable process within production. AMAT / APPLIED MATERIALS Centura 5200 ACL is an advanced performance etch tool that was designed to provide excellent etch uniformity, selectivity, consistency, and economical production for complex structure fabrication with small critical dimensions. The multi-chamber plasma etch reactor has a host of features, such as a low-inductance FCP source, a bimodal ECR source, a temperature control system, and diagnostics package for greater control and monitoring, that make it ideal for high throughput, cost-effective fabrication of a range of circuits designs.