Used AMAT / APPLIED MATERIALS Centura 5200 ACP / EPI #160377 for sale

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ID: 160377
Wafer Size: 12"
Vintage: 2007
Systems, 12" Application: CMOS EG Elevated source drain (4) Chambers: (RH3) Reduced pressure EPI RP Chambers: Recipe control AssuSETT: Yes Lamp type: USHIO BNA6 Susceptor type: Silicon carbide coated graphite Pin type: Hollow silicon carbide coated graphite Preheat ring: Slotted silicon carbide, coated graphite Susceptor support shaft: Centerpost Upper heat shield: 6 Deg flared-in upper outer Gas delivery options: Gas panel feed: Bottom MFC type: STEC Z500 Pump purge: yes Regulators and displays: Transducers and regulators Transducer display type: English (PSI) H2 leak detector: Yes Gas pallets: Slot 1: H2 Main 50 SLM normally open Slot 2: H2 SLIT 10 SLM normally open Slot 4 MFC: HCI Wafer clean 200 sccm Slot 4 Restrictor: HCI Chamber clean 15 SLM restrictor Slot 5: HCI 20 SLM Slot 8: DCS 300 sccm Slot 9: DCS 1 SLM MLD Mainframe: Mainframe type: Core ENP block 2 Loadlocks: Batch load lock Chamber interface: Vented stainless steel insert and door with viton DVR record license:Yes Water hose fittings: Yes Chamber common and integration: Mass flow verification: MFV for 4 Chamber system Multi wafer clean: MWC for 4 chamber system Factory interface options: WIP delivery type: OHT WIP delivery Number of load ports: 2 load ports eDiagnostics ready: Yes Load port types: Enhanced 25 wafer FOUP V2 Load port operator interface: Standard 8 light Configurable colored lights: Yes Air intake system: Top intake E84 Carrier handoff: Upper E84 interface enabled OHT E84 PIO Sensors and cables: Upper E84 sensors and cables E99 Carrier ID: Keyence with BCR Operator access switch: Yes Light towers: 4 Color configurable light tower Platform application: EPI ACP block 2 Remote options: Monitor 1: 17" Flat panel with keyboard on ergo arm Monitor 2: Remote 17" flat panel on stand Monitor 2 Cable: 50 feet with 41 feet effective Pumps: Process chamber pumps: Edwards IH1000 pump interface only Pump isolation valve: Yes Currently powered off 2007 vintage.
AMAT / APPLIED MATERIALS Centura 5200 ACP / EPI is a tool used in semiconductor fabrication processes that is designed to produce high-quality integrated circuits and wafer-level packaging. It is an advanced deposition and etch reactor that delivers the uniformity, repeatability and process precision required at the modern advanced nodes. AMAT Centura 5200 ACP / EPI offers an optimal platform for advanced materials deposition and etch processes. It is a single-wafer load lock system with a separate etching chamber used for dry etch processes. This allows for deposition and etching to be done inline instead of sequentially with a separate tool for each process step. The tool is also excellent for wafer-level passivation processes. APPLIED MATERIALS Centura 5200 ACP / EPI incorporates a modular substrate turn bar which supports wafer orientation for uniform etching. This design feature provides improved repeatability and process uniformity when compared to conventional tools. Centura 5200 ACP / EPI also features a powerful Robot Handler with a uni-directional transfer method. This feature ensures accurate alignment and secure handling of substrates when transferring them between the process modules. AMAT / APPLIED MATERIALS Centura 5200 ACP / EPI offers an enhanced process chamber design with improved plasma uniformity, repeatability and throughput. The plasma is generated with both electron cyclotron resonance (ECR) and inductively coupled plasma (ICP) sources. It also has a radio frequency (RF) power generator which enables the user to adjust power levels quickly and accurately. The user can also set pressure levels and a crystal quartz window temperature probe enables inspection and monitoring of process temperatures. AMAT Centura 5200 ACP / EPI offers technology and performance that enable the production of state-of-the-art integrated circuits and complex wafer-level packages. Its excellent deposition and etch uniformity meets the challenging process requirements at the latest advanced nodes. The advanced design of the tool ensures optimal substrate transport and handling, as well as the best possible repeatability and process precision. With features like its RF power generator, pressure control, temperature probe, and modular turn bar, APPLIED MATERIALS Centura 5200 ACP / EPI is an effective tool for achieving the highest possible performance for advanced semiconductor fabrication processes.
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