Used AMAT / APPLIED MATERIALS Centura 5200 ACP / EPI #160377 for sale
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ID: 160377
Wafer Size: 12"
Vintage: 2007
Systems, 12"
Application: CMOS EG Elevated source drain
(4) Chambers: (RH3) Reduced pressure EPI
RP Chambers:
Recipe control AssuSETT: Yes
Lamp type: USHIO BNA6
Susceptor type: Silicon carbide coated graphite
Pin type: Hollow silicon carbide coated graphite
Preheat ring: Slotted silicon carbide, coated graphite
Susceptor support shaft: Centerpost
Upper heat shield: 6 Deg flared-in upper outer
Gas delivery options:
Gas panel feed: Bottom
MFC type: STEC Z500
Pump purge: yes
Regulators and displays: Transducers and regulators
Transducer display type: English (PSI)
H2 leak detector: Yes
Gas pallets:
Slot 1: H2 Main 50 SLM normally open
Slot 2: H2 SLIT 10 SLM normally open
Slot 4 MFC: HCI Wafer clean 200 sccm
Slot 4 Restrictor: HCI Chamber clean 15 SLM restrictor
Slot 5: HCI 20 SLM
Slot 8: DCS 300 sccm
Slot 9: DCS 1 SLM MLD
Mainframe:
Mainframe type: Core ENP block 2
Loadlocks: Batch load lock
Chamber interface: Vented stainless steel insert and door with viton
DVR record license:Yes
Water hose fittings: Yes
Chamber common and integration:
Mass flow verification: MFV for 4 Chamber system
Multi wafer clean: MWC for 4 chamber system
Factory interface options:
WIP delivery type: OHT WIP delivery
Number of load ports: 2 load ports
eDiagnostics ready: Yes
Load port types: Enhanced 25 wafer FOUP V2
Load port operator interface: Standard 8 light
Configurable colored lights: Yes
Air intake system: Top intake
E84 Carrier handoff: Upper E84 interface enabled OHT
E84 PIO Sensors and cables: Upper E84 sensors and cables
E99 Carrier ID: Keyence with BCR
Operator access switch: Yes
Light towers: 4 Color configurable light tower
Platform application: EPI ACP block 2
Remote options:
Monitor 1: 17" Flat panel with keyboard on ergo arm
Monitor 2: Remote 17" flat panel on stand
Monitor 2 Cable: 50 feet with 41 feet effective
Pumps:
Process chamber pumps: Edwards IH1000 pump interface only
Pump isolation valve: Yes
Currently powered off
2007 vintage.
AMAT / APPLIED MATERIALS Centura 5200 ACP / EPI is a tool used in semiconductor fabrication processes that is designed to produce high-quality integrated circuits and wafer-level packaging. It is an advanced deposition and etch reactor that delivers the uniformity, repeatability and process precision required at the modern advanced nodes. AMAT Centura 5200 ACP / EPI offers an optimal platform for advanced materials deposition and etch processes. It is a single-wafer load lock system with a separate etching chamber used for dry etch processes. This allows for deposition and etching to be done inline instead of sequentially with a separate tool for each process step. The tool is also excellent for wafer-level passivation processes. APPLIED MATERIALS Centura 5200 ACP / EPI incorporates a modular substrate turn bar which supports wafer orientation for uniform etching. This design feature provides improved repeatability and process uniformity when compared to conventional tools. Centura 5200 ACP / EPI also features a powerful Robot Handler with a uni-directional transfer method. This feature ensures accurate alignment and secure handling of substrates when transferring them between the process modules. AMAT / APPLIED MATERIALS Centura 5200 ACP / EPI offers an enhanced process chamber design with improved plasma uniformity, repeatability and throughput. The plasma is generated with both electron cyclotron resonance (ECR) and inductively coupled plasma (ICP) sources. It also has a radio frequency (RF) power generator which enables the user to adjust power levels quickly and accurately. The user can also set pressure levels and a crystal quartz window temperature probe enables inspection and monitoring of process temperatures. AMAT Centura 5200 ACP / EPI offers technology and performance that enable the production of state-of-the-art integrated circuits and complex wafer-level packages. Its excellent deposition and etch uniformity meets the challenging process requirements at the latest advanced nodes. The advanced design of the tool ensures optimal substrate transport and handling, as well as the best possible repeatability and process precision. With features like its RF power generator, pressure control, temperature probe, and modular turn bar, APPLIED MATERIALS Centura 5200 ACP / EPI is an effective tool for achieving the highest possible performance for advanced semiconductor fabrication processes.
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