Used AMAT / APPLIED MATERIALS Centura 5200 DLH #9184768 for sale

AMAT / APPLIED MATERIALS Centura 5200 DLH is a multi-chamber, dual-lane, inductively coupled plasma (ICP) reactor used in semiconductor fabrication. Designed with optimised productivity and single wafer throughput up to 2x75mm at 200-300mm/minute, this equipment provides robust performance under a wide range of process conditions. The system design employs a two-chamber configuration, with the two chambers set up in tandem. The first chamber houses the source and high voltage power supply in addition to the plasma chamber and plasma source. The lower chamber holds a chemical-mechanical polishing (CMP) table, an end effector and other motion components. A central computer interface manages the automation and process recipes. The unit is equipped with an intuitive touchscreen based user interface for easy and precise configuration and control. The reactor includes state-of-the-art plasma sources built with advanced ICP technology for high deposition rate and uniformity. It can be configured for both liquid and gas delivery systems, with a dedicated gas delivery machine in the first chamber. The process chamber is equipped with a robust ceramic core and a precise dielectric window. It is designed to withstand large process pressures and maintain high selectivity. To ensure precise control and repeatability, the tool has RF frequency susceptibility ranged up to 2MHz, in addition to frequency and DC bias control with super speed 4MHz frequency. AMAT Centura 5200 DLH is capable of dielectric films and hard mask films, making it ideal for a wide range of applications. It also offers the flexibility of backside processing, allowing for through-silicon via processing. The asset is designed for both batch and single wafer processes with appropriate wafer boat rotation and other automated operations. Overall, APPLIED MATERIALS Centura 5200 DLH is a highly versatile reactor that delivers high throughput and excellent uniformity for a wide range of process conditions. With its multi-chamber design, advanced ICP technology and intuitive user interface, it is ideal for the fabrication of delicate integrated circuits.