Used AMAT / APPLIED MATERIALS Centura 5200 DPS R1 #171348 for sale
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ID: 171348
Metal etcher, 8"
(2) DPS R1 Metal chambers with (QTY 2) Seiko-Seiki STP-H1000C
(2) ASP+ chambers
Robots: HP+
Wafer shape: No notch
SMIF interface: No
MF Facilities: Bottom
Loadlock type: narrow body with auto-rotation
Loadlock slit valve O-ring: Viton O-ring
Chamber A: DPS R1 metal
Chamber B: DPS R1 metal
Chamber C: ASP+
Chamber D: ASP+
Chamber E: Single slot cooldown
Chamber F: Orienter chamber
Process A: Metal
Process B: Metal
Process C: Strip
Process D: Strip
1999 vintage.
AMAT / APPLIED MATERIALS Centura 5200 DPS R1 reactor is a high-throughput chemical vapor deposition (CVD) equipment designed for semiconductor production. It offers a wide range of features making it an ideal choice for a variety of applications. The enhanced process control of this system ensures consistent high-quality deposits that are free from excess material, allowing for higher yields and reduced time to market. AMAT Centura 5200 DPS R1 offers a multi-zone reactor design and automated control systems with a high degree of flexibility. This allows for precision control of gas flow and thermal energy deposition during process runs. In addition, the unit boasts a multi-nozzle design with independent gas control that enables process of small or large areas with minimal limitations. The machine also provides a high temperature furnace which can reach temperatures up to 1400 °C. This allows for excellent thermal uniformity and highly efficient processing of any material. The tool also allows for in-situ monitoring and control of the deposition process using sophisticated embedded software. This provides a much higher level of control and accuracy of the high performance CVD process. APPLIED MATERIALS Centura 5200 DPS R1 also features an advanced data management asset for tracking, archiving and analysis of results. The model also has a 10 Chamber loadlock design enabling reduced equipment cycle time and lower cost of ownership. Finally, this system comes with an innovative flow control unit that provides the flexibility to fine tune gas flows without the need for complicated shut-off valves. In conclusion, Centura 5200 DPS R1 provides a combination of features and flexibility that is unmatched by other CVD systems. Its advanced technologies make it an ideal solution for high-efficiency, high-quality CVD processes across a range of applications. Its ability to precisely control gas flow, thermal energy and process data provide performance and accuracy that is unparalleled.
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