Used AMAT / APPLIED MATERIALS Centura 5200 DPS R1 #9099752 for sale
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ID: 9099752
Wafer Size: 8"
Vintage: 1998
Metal etcher, 8"
Wafer type: 8" SNNF
(2) DPS R1 metal chambers
(2) ASP+ chambers
(1) Orienter
(1) Cool down
Load Locks: wide body with auto-rotation
Robot: VHP+
Platform type: Etch Centura Phase II
SMIF: not available
RF rack, GMW25
Chamber A & B: DPS R1 Metal
Single cathode
Turbo pump: Seiko Seiki STP-H1303
Upper chamber body: Y2O3 coating
Electrostatic chuck type: polymide ESC
Upper chamber o-ring: Viton
Dome and EDTCU: R1 DTCU
Endpoint type: monochromator
Bias generator: ACG 6B
Bias match: STD
Capture ring: STD polymide ESC
Source generator: STD 2500W
Slit valve o-ring: Viton
Throttle Gate Valve: TGV VAT65
Chamber C & D: APS+
Process kit: chuck
O-ring: silicon
Process control: manometer
Slit valve o-ring: Viton
Plasma tube o-ring: Kalrez
Microwave
Smart match
Magnetron head
Applicator
VDS assembly
Chamber E: STD cool down
Chamber F: orienter
Gas Panel: control VME 1
Controller: Centura common rack
Generator rack: 84" rack
Line frequency: 50Hz
Loadlock / Cassette:
Loadlock type: WBLL with auto-rotation
Loadlock platform: universal
Cassette type supported: KA200 85MTRHS 47C02
Loadlock cover finish: anti-static painted
Loadlock slit valve o-ring type: Viton
Wafer mapping: enhanced
Integrated cassette sensor: yes
Transfer Chamber:
Manual lid hoist: yes
Robot type: Centura VHP+
Robot blade option: roughened Al blade
Wafer on blade detector: basic
Loadlock vent: bottom
Signal Light Tower: 3-color, front panel
Top light color: red
Second light color: yellow
Third light color: green
Light tower buzzer: disabled
Endpoint:
Mounting: stand alone
Cart: 56" tall, painted
Monochromators: (2)
Total Endpoints: (2)
System Controller:
Standard GEM interface: yes
Controller type: 84" common controller
Electrical interface: bottom feed
Exhaust: top
System Monitors:
Type: CRT
Monitor 1: stand alone
Cables: 25'
AC Rack:
GFI: 30mA
Type: 84"
Controller facility interface: remote UPS interface only
Generator Rack:
Cooling water: water manifold
Manifold facilities: 3/4" compression tube fittings
Gas Delivery Options:
Vapor Delivery System (VDS): Ultra Clean
Component selection: premium
Valve: Fujikin
Transducer: Millipore
Regulator: Veriflo
Filter: Millipore
Transducer displays: (1) display per stick
MFC type: Unit 8160
Gas Panel Pallet: A/B
Gas Line Requirement: 4/6
Gas Line Configuration:
Line 1 Gas CL2 MFC Size 200 SCCM
Line 2 Gas BCL3 MFC Size 100 SCCM
Line 5 Gas N2 MFC Size 20 SCCM
Line 6 Gas EMPTY MFC Size EMPTY
Line 7 Gas CHF3 MFC Size 20 SCCM
Line 8 Gas O2 MFC Size 500 SCCM
Line 9 Gas SF6 MFC Size 200 SCCM
Line 10 Gas AR-S MFC Size 200 SCCM
Pallet Corrosive Gas Lines: (2)
Pallet Inert Gas Lines: (5)
Filters: (7)
Gas Panel Pallet C/D:
Gas Line Requirement: 0/4
Gas Line Configuration:
Line 3 Gas O2 MFC Size 5 SLM
Line 4 Gas N2-S MFC Size 1 SLM
Line 5 Gas VDS MFC Size 750 sccm
Pallet Inert Gas Lines: (3)
Filters: (3)
Gas panel facilities hook-up: top feed, multi-line drop
Gas panel exhaust: BD chamber side top
Gas panel controller: VME
Safety:
EMO switch: turn to release, ETI compliant
EMO guard ring: included
Smoke detector at controller: yes
Smoke detector at MF no skin: yes
50 Hz
1998 vintage.
AMAT / APPLIED MATERIALS Centura 5200 DPS R1 is a powerful multi-module production platform designed for high-performance epitaxial layer deposition. This reactor is designed to produce high-quality materials with low-defect densities, enabling the production of complex and next generation optoelectronic devices. AMAT Centura 5200 DPS R1 integrates multi-module technology, advanced surface analysis techniques and versatile deposition techniques in a single platform. The equipment is composed of mainframe, hutch, process chamber and a loadlock to achieve process reliability and uniformity. The included modules are control system, power supply, gas manifold, ion source, turbomolecular pump, pressure controllers, and eroding source. The mainframe integrates source, chamber and critical components to enable uniformity distribution of the source across the wafer. The control unit features recipe-driven processes with a complete range of monitoring and control functionalities. The machine also incorporates advanced surface analysis techniques to ensure process accuracy while achieving successful results. APPLIED MATERIALS Centura 5200 DPS R1 is equipped with sophisticated data acquisition and process control software to enable efficient tool operation. This software is linked to the multiple components in the asset and can be used to monitor and control parameters such as wafer temperature, reactive gas flow, pressure, and reactive gas distribution, among others. The chamber of this reactor is thermally and mechanically stable, allowing for precise process repeatability and uniformity. Centura 5200 DPS R1 includes both dry etch and ion implant capabilities, enabling increased flexibility and larger applications. Process versatility is further supported by the inclusion of a variety of deposition techniques, such as metal organic chemical vapor deposition (MOCVD) and atomic layer deposition (ALD). Overall, AMAT / APPLIED MATERIALS Centura 5200 DPS R1 is an advanced production platform ideal for creating optoelectronic devices with high-performance characteristics and low-defect densities. It offers versatile deposition capabilities with advanced surface analysis techniques to achieve uniformity and process repeatability. This robust model enables users to produce complex and intricate devices and materials.
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