Used AMAT / APPLIED MATERIALS Centura 5200 DPS #9211801 for sale
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ID: 9211801
Wafer Size: 6"
Vintage: 1998
Metal etcher, 6"
P/N: 0010-70789
Chamber
Centura mainframe
(3) Process chambers
Chamber A: DPS Metal
Chamber B: DPS Silicon
Chamber C: MxP+ Oxide, MxP+ RF match
Chamber E / F: Remote orienter
Centura Gas panel
Narrow body tilt-out loadlocks
End point detection
HP Robot
Centura DPS Cathode
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Power distribution cabinet
Remote power supply cabinet:
(2) SEIKO SEIKI STP-A1303C Controllers
APC Backup battery
SEIKO SEIKI STP-H1000C Control unit
RFPP LF-5 RF Power supply
RFPP RF20R Generator
ADVANCED ENERGY HFV 8000 RF Generator
(2) ENI OEM-12B3 RF Generators
(2) NESLAB HX-150 Chillers
(2) EDWARDS iH80 Pumps
(2) EDWARDS QDP80 Dry pumps
(2) APPLIED MATERIALS Heat exchanger carts
Power supply: 208 VAC, 50/60 Hz, 3 Phase, 320 A
1998 vintage.
AMAT / APPLIED MATERIALS Centura 5200 DPS is a large scale 200mm deposition equipment designed to deposit highly conformal layers of materials over large areas. This reactor features a high accuracy, multi-zone substrate temperature control, a thermally controlled deposition chamber, and a triple-style gas delivery system that is adjustable to meet the substrate shape of each wafer. This unit is designed to be compatible with multiple manufacturing processes including chemical vapor deposition (CVD), atomic layer deposition (ALD), and atomic layer etching (ALE). AMAT Centura 5200 DPS is an advanced machine for depositing ultra-thin films with high uniformity, repeatability, and substrate coverage. It is capable of depositing films up to 200-500 nanometers thick at rates of up to 1000 nm per hour. The chassis is composed of aluminum, silicon and stainless steel for maximum durability without sacrificing thermal performance. It also features a large bell-jar that can fit multiple tools, with the ability to keep multiple radii and tube lengths in one tool. APPLIED MATERIALS Centura 5200 DPS is built for ease of use, maintenance, and cleaning. It has an on-board noncontact wafer mapping asset that enables repeatable, safe wafer movements with no contamination. It also has automatic pressure control and mass flow controllers to ensure accuracy and repeatability. The model features a fully automated process as well as manual commands, so users can quickly adjust processes as they see fit. Centura 5200 DPS also features an automated leak test equipment that can detect any gas leaks or fractures. By automatically checking the integrity of the system, users can quickly make adjustments and avoid costly repairs or delays. The unit also has an advanced thermal management machine to regulate pressure and temperature more efficiently. AMAT / APPLIED MATERIALS Centura 5200 DPS is a reliable deposition tool for high-quality thin film deposition. It is ideal for producing high-precision advanced materials and nanostructures like MEMS and NEMS with high accuracy and repeatability. The asset combines performance and advanced multi-zone temperature control technology for chipmakers, research, and laboratory applications.
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