Used AMAT / APPLIED MATERIALS Centura 5200 DxZ #79721 for sale

AMAT / APPLIED MATERIALS Centura 5200 DxZ is a PECVD (plasma-enhanced chemical vapor deposition) reactor built for the deposition of dielectric and other advanced materials. It features a large adjustable process zone dynamically optimized to maximize pressure balance and uniformity. With its high throughput, low thermal budget, and robust design, AMAT Centura 5200 DxZ provides optimal performance in the deposition of a wide range of materials. APPLIED MATERIALS Centura 5200 DxZ features a three-zone, generalized process chamber design. Its spacious volume enables up to nine wafers to be processed at a time. The design is supported by a high-performance exhaust that rapidly removes reaction byproducts to maintain optimal process conditions. Centura 5200 DxZ also has an option for low temperature wafer heating for greater uniformity. AMAT / APPLIED MATERIALS Centura 5200 DxZ is capable of depositing semiconductor materials from a variety of sources. This includes process components such as silicon hydride, silanes, TEOS, and chlorosilanes. The reactor also makes use of traditional PVD, ultrahigh purity, and low thermal budget techniques for maximum process compatibility. In addition, optically thick films are facilitated by tight control of the deposition power. AMAT Centura 5200 DxZ also features advanced diagnostics. Its detector array and dedicated TDM (thrust deposition monitor) module allow precise monitoring of films deposited in real-time. The system can then be adjusted to compensate for any process flaws, ensuring optimal uniformity, conformality, and quality. Safety features have not been overlooked either. APPLIED MATERIALS Centura 5200 DxZ employs a variety of protection mechanisms to ensure safe operation, including an enclosed chamber, a safety panel, and gas discharge systems. The reactor also has an emergency shutoff switch, as well as an automated endpoint detection mechanism designed to protect personnel and equipment from hazardous reaction byproducts. In summary, Centura 5200 DxZ from AMAT is a high-performance and robust PECVD reactor. With its adjustable process zone, high throughput and low thermal budget capability is provides complete control for various wafer processing applications. Its advanced diagnostics and safety features ensure that the device is safely and reliably operated to provide optimal results.