Used AMAT / APPLIED MATERIALS Centura 5200 Epi #157515 for sale
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ID: 157515
Wafer Size: 8"
Reactor, 8"
3 HTF Epi chambers
ATM or RP
Standard (Legacy) gas panel.
AMAT / APPLIED MATERIALS Centura 5200 Epi reactor is designed to produce semiconductor devices with exceptional quality and robust performance. This advanced reactor is a state-of-the-art tool used in the manufacture of high-performance semiconductor devices. The reactor features an advanced thermal control equipment with temperature stabilization of up to 0.01°C, enabling efficient semiconductor device fabrication with uniform microdevice features. In addition, the reactor features a computer-controlled substrate temperature control system that allows precise temperature control, critical for minimizing process-induced stress and minimizing defects. The reactor also offers a fully automated, integrated device fabrication process with real-time data monitoring and real-time in situ analysis. This enables users to easily optimize process parameters for different materials and process conditions. AMAT Centura 5200 Epi Reactor provides users with automated heating, cooling, and atmosphere control to improve the performance of semiconductor substrates. The unit is based on a computer-controlled reaction chamber containing up to three silicon wafers. This allows rapid device fabrication and minimization of processing time, as well as improved substrate uniformity. The reactor is also equipped with a laminar flow gas distribution machine to maximize uniform gas distribution over the entire vessel that is capable of supplying up to 0.1 or 1.0 mbar of argon-nitrogen or argon-hydrogen mixtures. This tool allows for precise control over the wafer chamber, ensuring consistent and repeatable passivation and circuit formation. Furthermore, APPLIED MATERIALS Centura 5200 Epi Reactor's advanced wafer temperature and atmospheric control systems enable users to precisely tailor process parameters to their specific device fabrication needs. The asset also features wet or dry nitrogen gas ingredients and a variety of pre-wired electrical ports, facilitating quick and easy access to tested parameters during device fabrication. The application-oriented design of Centura 5200 Epi Reactor ensures that the device fabrication process can be personalized according to individual user needs. The model offers an array of user-friendly control and monitoring functions, enabling users to optimize their process for maximum yield and performance. In addition, the tool is designed to guarantee reliable and repeatable production results, and is commercially available.
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