Used AMAT / APPLIED MATERIALS Centura 5200 Epi #164775 for sale
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ID: 164775
Reactor
ATM 2 Chamber configuration
AC Rack:
3 Phase, 208 V, 400 A
CB1 Trip unit: 500 A
GFCI option: Yes
Water leak detect option: Yes
AccuSETT controller: Yes (3 channel)
5 Phase controller: Yes
Loadlock:
Type: Narrow body
Wafer mapping: Yes
Wafer slide detect option: Yes
Baratron: MKS
Transfer chamber:
Robot type: HP
Center finder: OTF
Slit valve plate: Insert O-ring type
Col down chamber: Yes (#F position only)
Robot blade: Quartz
Process chamber (2 Chambers):
Chamber typeL: EPI ATM
Susceptor: 0200-01932
Pre heat ring: 0200-35081
Susceptor support shaft: 0200-00412
Wafer lift shaft: 0200-00412
Upper dome: 0200-35084
Lower dome: 0200-35042
Temp pyrometer: (3ea) with AUX
Baratron: 1000 Torr
AMV: (2ea) Inner/outer
Blower type: VSB
Blower motor: Baldor
Gas panel:
MFC Unit 1660
ETC:
Umbilical cable: 55 Ft
Transformer:
TR: 480/208V, 130 kVA
2000 vintage.
AMAT / APPLIED MATERIALS Centura 5200 Epi is an advanced plasma-enhanced deposition equipment. It is a batch-type reactor, commonly used to deposit advanced materials such as silicon, germanium, and silicon-germanium hetero-structures for integrated circuit manufacture. AMAT Centura 5200 Epi features an industry-leading both vertical and horizontal substrate configuration, allowing for the highest level of scalability and flexibility in production. APPLIED MATERIALS Centura 5200 Epi is powered by two hybrid inductively coupled plasma sources that deliver a highly uniform low-pressure deposition. It is equipped with Endura Ion Energy Shaping III (IES III), a proprietary technology that enables precise surface self-limiting control and layer-by-layer deposition uniformity. These layers consist of high-performance dielectric and metallization layers. The centrifugal gas injector (CGI) and end-of-run cooling system are designed to allow for rapid cooling and recycling in order to maximize cycle times. The CGI allows for quick, precise, and repeatable introduction of main process gases into the reactor. This increases the efficiency of the deposition chamber by maintaining the thermal balance. The apparatus also features a remote end-of-run cooling profile, allowing the chamber to quickly reach a safe temperature before switching to an inert atmosphere. This ensures maximum cycle times and particle control through rapid cooling of the process chamber. Centura 5200 Epi also features a software suite of process recipes and exacting control technologies. The unit can be configured for high-temperature, high-rate deposition for higher throughput applications. Additionally, the built-in non-contact wafer temperature measurement machine provides quick, accurate in-situ temperature measurement for process control. Overall, AMAT / APPLIED MATERIALS Centura 5200 Epi is the perfect tool for high-precision, highly reliable production processes. Its unique combination of features allows it to deliver the highest level of materials deposition uniformity and scalability demanded by the semiconductor industry.
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