Used AMAT / APPLIED MATERIALS Centura 5200 MxP+ #9169931 for sale

AMAT / APPLIED MATERIALS Centura 5200 MxP+ is a multi-chamber molecular beam epitaxy (MBE) reactor designed to grow epitaxial layers on various substrates, manufactured by AMAT. It operates at temperatures from -220°C to 700°C and is capable of growing epitaxial layers of silicon and III-V materials. The equipment is a one of a kind, enabling multiple wafers to be processed simultaneously with MBE deposition rates of up to 6.8Å/s. It features an advanced Multi-Crystalline Photoresist (MCP) film for precise selective area growth (SAG) of epitaxial layers. AMAT Centura 5200 MxP+ utilizes a high-power vision system with an automated focus unit and a wafer threading machine for efficient wafer handling. The tool also can be used with a variety of wafer transfer mechanisms for loading and unloading wafers. In addition, the asset is equipped with high-precision closed-loop motion control systems and an advanced interlock model to ensure accurate and precise positioning of the wafers. It features a powerful rotating motor that enables precise rotation of the wafer and accurate positioning of the wafer in the loading and unloading spaces. It also has a comprehensive equipment of sensors and optical feedback for precise temperature and pressure control. The robust vacuum system provides a stable and consistent growth environment and is capable of keeping the entire unit clean. APPLIED MATERIALS Centura 5200 MxP+ includes an advanced PC-based interlock tracking machine for real-time monitoring and detailed process optimization. It also provides an easy to use graphical user interface for easy operation and process parameter control. The reaction chamber is equipped with a precision wafer heater for very responsive temperature control. It has multiple shutter systems for the various sources, enabling precise control of material supply for deposition. Centura 5200 MxP+ provides unmatched performance and is ideal for advanced applications such as superlattice research and 3D integrated circuits, enabled by selective area epitaxy. It is a reliable tool used to produce high-yield epitaxial layers with excellent layer uniformity and smooth surfaces. It is a versatile asset that can be easily customized to meet the requirements of various applications.