Used AMAT / APPLIED MATERIALS Centura 5200 MxP+ #9351566 for sale

AMAT / APPLIED MATERIALS Centura 5200 MxP+ is a multi-chamber epitaxial reactor designed to allow production-level deposition of thin films and epitaxial layers on silicon substrates at temperatures ranging from 200°C to 420°C. It has been engineered with Integrated Process Control (IPC) technology in order to provide customers with consistent and repeatable results. AMAT Centura 5200 MxP+ is equipped with a number of features that make it a superior choice for production-level deposition processes. APPLIED MATERIALS Centura 5200 MxP+ is a flexible and versatile epitaxial reactor designed with mass production in mind. It is a high throughput equipment that is engineered with the ability to process various substrate sizes, types, and thicknesses. The system is equipped with an advanced multi-chamber design that allows for superior process uniformity for all applications. Centura 5200 MxP+ is built with an independent plasma source for each chamber. The plasma sources provide independent source power for each process chamber, increasing the stability and uniformity of the deposition process. AMAT / APPLIED MATERIALS Centura 5200 MxP+ is equipped with a number of features to ensure consistent and repeatable results. The unit is engineered with Uniform Film Thickness Control (UFTC) technology that allows for the precise control of deposition parameters. The UFTC provides thickness control throughout the chamber, ensuring uniform film thickness at all points on the substrate. The machine also includes a closed-loop process control tool, precision filtration systems, and advanced real-time process monitoring. AMAT Centura 5200 MxP+ is capable of producing a wide range of sophisticated materials and components. It is suitable for applications such as semiconductor device fabrication, MEMs, microfluidics, and metrology. The asset supports a range of deposition processes, including atomic layer deposition, chemical vapor deposition, sputtering, and electroplating. In conclusion, APPLIED MATERIALS Centura 5200 MxP+ is an advanced epitaxial reactor designed for production-level depositions. The model is engineered with advanced features such as integrated process control (IPC), precision filtration systems and uniform film thickness control (UFTC). Centura 5200 MxP+ provides customers with reliable and consistent results, and is suitable for a wide range of applications.