Used AMAT / APPLIED MATERIALS Centura 5200 WxP #118471 for sale

AMAT / APPLIED MATERIALS Centura 5200 WxP is a high-performance chemical vapor deposition (CVD) reactor specifically designed as a versatile platform for growing ultra-thin films and nanostructures. It is a highly flexible, high-temperature (up to 1000°C) CVD equipment with a wide range of capabilities and features. AMAT Centura 5200 WxP has two separate reaction chambers. The main reactor chamber is the heart of the CVD system, with the second chamber used for auxiliary processes such as pre-deposition and post-deposition processes. The main reactor chamber is capable of processing four-inch diameter wafers simultaneously, with a high thermal uniformity across the surface. The reaction chamber has a maximum temperature of 1000°C, with a range of 0-1000°C in 1°C increments. It is equipped with a programmable high-temperature gas delivery unit, temperature control and gas mixing machine, and a mass flow controllers for precise gas delivery. The CVD reactor is equipped with a variety of innovative technologies, including a proprietary pulsed gas loading tool, a real-time digital temperature control asset, and a dual quartz sacrificial window in the main reaction chamber. APPLIED MATERIALS Centura 5200 WxP also has advanced capability for both thermal and non-thermal integration of various process gases, as well as support for up to four different source gases simultaneously. One of the unique features of Centura 5200 WxP is its closed-loop technology, capable of automating and precisely controlling CVD deposition processes without any manual intervention. This enables automated process control with minimal human intervention. AMAT / APPLIED MATERIALS Centura 5200 WxP can be used to deposit a variety of thin-film and nanostructures materials, such as metals, oxides, polymers, and functionalized materials. It is an advanced deposition platform capable of depositing a wide range of complex materials, from nanoscale structures to high-k dielectric materials. The high temperature and ultra-thin deposition capabilities of the model make it ideal for research applications involving ultra-thin films and nanostructures, such as quantum computing and sensors. AMAT Centura 5200 WxP is a powerful and versatile CVD equipment, capable of producing a wide range of ultra-thin films and nanostructures. Its advanced real-time temperature control, pulsed gas loading, and multiple process gas capabilities make it the ideal choice for deposition of complex nanostructures and functional materials. With its closed-loop automation, APPLIED MATERIALS Centura 5200 WxP is well suited for research and industrial applications requiring precise temperature control and efficiency.