Used AMAT / APPLIED MATERIALS Centura 5200 WxZ WCVD #9008251 for sale

AMAT / APPLIED MATERIALS Centura 5200 WxZ WCVD (chemical vapor deposition) reactor is an advanced piece of semiconductor processing equipment designed to deposit thin film layers over surfaces for a range of products. The Centura 5200 WxZ is specifically designed to deposit uniform and conformal thin films for both compound semiconductor and metal applications. This is achieved through a variety of techniques including low temperature physical vapor deposition (PVD), atmospheric pressure chemical vapor deposition (APCVD) and wide range chemical vapor deposition (WCVD). The Centura 5200 WxZ is equipped with a high-vacuum chamber for removing impurities from the deposition environment, reducing the chances of contamination during the process. Additionally, the chamber is equipped with a multi-chamber wafer handling equipment that enables efficient loading and unloading of wafers while depositing films. The wafer handling system also makes it easy to monitor and control each wafer during processing. The reactor also features an integrated, computer-controlled in-situ gas delivery unit which precisely delivers, monitors, and controls the gas flows and transport media in order to achieve maximum uniformity in the deposition process. The Centura 5200 WxZ is a powerful, high performance machine with heightened precision capabilities. It is capable of depositing films of various thicknesses and textures for a wide range of products, including gallium nitride (GaN) and gallium oxide (GaO) thin films, as well as metal-oxide-semiconductor (MOS) structures for optoelectronics applications. This advanced tool enables users to achieve greater process repeatability and higher throughput. In addition to offering precise control, the Centura 5200 WxZ also provides superior reliability and durability. The asset is constructed from robust materials which are designed for superior operation in the most challenging of conditions. It also features an advanced process control model which makes it easier for users to monitor and modify parameters in real-time, ensuring optimal performance at all times. Overall, AMAT Centura 5200 WxZ WCVD reactor is a reliable and powerful equipment for depositing thin films and achieving superior process repeatability for a range of applications. Its advanced wafer handling system and precise gas delivery unit enable users to achieve uniform and conformal films with maximum repeatability. The machine's superior build quality also makes it a strong and durable piece of equipment capable of withstanding even the most challenging of conditions.