Used AMAT / APPLIED MATERIALS Centura 5200 #118476 for sale

AMAT / APPLIED MATERIALS Centura 5200 is an advanced semiconductor etch reactor that provides high-performance photolithography solutions for etching applications and can be used in the production of complex circuits. It offers a wide range of etch and deposition solutions for various application needs and is highly reliable for repeatable high-quality results. The equipment is designed with a unique combination of dual source plasma generation and multiple auto-refill pumping systems. The dual source plasma allows for applications to etch multiple layer materials or far more complex substrates and feature sizes. The vacuum chamber also has a "Load-lock" feature that allows chips to be rapidly loaded and unloaded while minimizing contaminants. AMAT Centura 5200 is capable of providing a wide range of film thicknesses, profile shapes and feature sizes. The system is equipped with automated software features, allowing users to customize process recipes and control the unit more accurately. It also offers a wide range of in-line environmental monitoring and feedback control features, allowing the machine to identify process anomalies quickly and respond appropriately. APPLIED MATERIALS Centura 5200 can process a variety of materials, including SiO2, SiC, Al2O3, GaAs, GaN and other materials. The tool also supports advanced etch processes such as etching of magnetic recording media and MEMS applications. It is also capable of generating uniform film deposition with a high yields and excellent etch uniformity. Centura 5200 offers a wide range of process variables, including temperature, pressure, time, reactant gases and other parameters that can be set to meet specific application needs. It also offers superior process control and repeatability, allowing users to achieve consistent, high-quality results in production. Additionally, the asset is designed with a low cost-of-ownership, providing users with a long service life of reliable operation.