Used AMAT / APPLIED MATERIALS Centura 5200 #146830 for sale

Name: AMAT / APPLIED MATERIALS Centura 5200
Brand: AMAT / APPLIED MATERIALS
SKU: 146830
Availability: SoldOut

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Reactors

Manufacturer

AMAT / APPLIED MATERIALS

Model

Centura 5200

ID: 146830

Wafer Size: 8"

Vintage: 1996

DxZ System with 3 Chambers, 8" RF cleaning type Application: CVD Platform Type CENTURA I BODY SBC Board V452 Chamber Type Position A DxZ Nitride Position B DxZ Nitride Position C DxZ Nitride Position D Blank Position E MULTI COOLDOWN Position F CHA - DxZ CHAMBER Chamber Options Process Kit Customer Option Baratron Guage 10Torr / 1Torr Match AE 3155094-003A Heater Lift 0010-38426 RF Generator RFG 2000-2V EPD 0500-01047 Heater Driver 0190-09419 CHB - DxZ CHAMBER Chamber Options Selected Option Process Kit Customer Option Baratron Guage 10Torr / 1Torr Match AE 3155094-003A Heater Lift 0010-38426 RF Generator RFG 2000-2V EPD 0500-01047 Heater Driver 0190-09419 CHC - DxZ CHAMBER Chamber Options Selected Option Process Kit Customer Option Baratron Guage 10Torr / 1Torr Match AE 3155094-003A Heater Lift 0010-38426 RF Generator RFG 2000-2V EPD Heater Driver 0190-09419 CHE - COOLDOWN CHAMBER Type Multi cooldown CHF - (OA) ORIENTER Orienter Standard Gas Delivery Options Pallet Options Component Selection STANDARD Valve Veriflo Transducer MKS Regulator Filter Transducer Displays MFC Type STEC 4400 Gas Panel Pallet A Gas Line Requirement Gas Line Configuration Line 1 Gas NH3 MFC Size 2 SLM Line 2 Gas N2 MFC Size 5SLM Line 3 Gas SiH4 MFC Size 200 SCCM Line 4 Gas NF3 MFC Size 1 SLM Line 5 Gas N2O MFC Size 1 SLM Line 6 Gas CF4 MFC Size 3 SLM Line 7 Gas N20 MFC Size 4V 239.7 SCCM / 2V 119.8SCCM Line 8 Gas N2 MFC Size 5 SLM Line 9 Gas HE MFC Size 5SLM Gas Panel Pallet B Gas Line Requirement Gas Line Configuration Line 1 Gas NH3 MFC Size 2 SLM Line 2 Gas N2 MFC Size 5SLM Line 3 Gas SiH4 MFC Size 200 SCCM Line 4 Gas NF3 MFC Size 1 SLM Line 5 Gas N2O MFC Size 1 SLM Line 6 Gas CF4 MFC Size 3 SLM Line 7 Gas N20 MFC Size 4V 239.7 SCCM / 2V 119.8SCCM Line 8 Gas N2 MFC Size 5 SLM Line 9 Gas HE MFC Size 5SLM Gas Panel Pallet C Gas Line Requirement Gas Line Configuration Line 1 Gas NH3 MFC Size 2 SLM Line 2 Gas N2 MFC Size 5SLM Line 3 Gas SiH4 MFC Size 200 SCCM Line 4 Gas NF3 MFC Size 1 SLM Line 5 Gas N2O MFC Size 1 SLM Line 6 Gas CF4 MFC Size 3 SLM Line 7 Gas N20 MFC Size 4V 239.7 SCCM / 2V 119.8SCCM Line 8 Gas N2 MFC Size 5 SLM Line 9 Gas HE MFC Size 5SLM Transfer Chamber Transfer Ch Manual Lid Hoist YES Robot Type CENTURA HP ROBOT Robot Blade Option Ceramic Blade Remotes Heat Exchanger AMAT 0 Currently stored in a cleanroom 1996 vintage.

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AMAT / APPLIED MATERIALS Centura 5200 reactor is an advanced plasma-enhanced chemical vapor deposition (PE-CVD) system that provides a clean, low-temperature process environment for semiconductor device fabrication. It is an ultra-high-vacuum, horizontally operated reactor and offers ultimate flexibility with a wide range of CVD process recipes and materials. AMAT Centura 5200 utilizes microwave frequencies, ion plating, and plasma-enhanced reaction sources to achieve more controllable and reproducible processes to lay down the thin-film layers on the substrate, enhancing the device performance and reliability. The instrument can accurately and precisely control the source gas temperatures and flow rates for required process parameters, as well as the temperature of the substrate itself. APPLIED MATERIALS Centura 5200 features a multi-zone exothermal heating furnace system to maximize productivity, as well as a group of end-point sensors carefully placed in each reaction zone to guarantee homogeneous processes for the consistent formation of high-quality thin-film layers. Ultimately, the uniform film thickness, accompanied by advanced deep profile analysis (DPA), process monitoring and feedback loops guarantee the repeatability of even extremely complex processes. The addition of a large-area substrate holder provides the flexibility of running two different processes at the same time with a minimal footprint. Additionally, the advanced automatic RF/DC power generator of Centura 5200 provides a precise power control with a faster ramp-up time than traditional systems. Finally, AMAT / APPLIED MATERIALS Centura 5200 includes user-friendly software that enables faster process setup, analysis of results, recipe formation, and more. It has been extensively tested and certified in key laboratories worldwide and is considered one of the most advanced and efficient PE-CVD systems available.