Used AMAT / APPLIED MATERIALS Centura 5200 #148644 for sale

AMAT / APPLIED MATERIALS Centura 5200 is an Epitaxial Reactor designed for advanced semiconductor wafer fabrication. It is suitable for crafting the world's smallest transistors, as well as transistors with superior speed and performance. AMAT Centura 5200 is a Dual Pocket Process Chamber, with a larger chamber providing high through-put and a smaller chamber offering higher precision. Its advanced auto-loading and loading retention equipment ensures an efficient and reliable production process in a clean environment. The reactor is equipped with a Heavy Ion Source, capable of superior ion implantation and etching processes. It also contains the MAXC uniformity system, a cluster of four advanced sensors which measure process doses to ensure the highest substrate uniformity. The ion source and uniformity unit of APPLIED MATERIALS Centura 5200 are powered by the MESA Advanced Plasma Source. This provides superior etch rates, consistent power and superior process stability and uniformity over a wide range of speeds and process recipes. Centura 5200 can also be integrated with an advanced track machine technology. This advanced tool features robotic arms for transferring wafers, with an unmatched degree of accuracy and precision. This asset provides smooth operation, regardless of pre-assigned recipes or the speed of production. AMAT / APPLIED MATERIALS Centura 5200 is an energy-efficient reactor and allows energy savings from the pre-set recipe without sacrificing quality or speed. It has a calibration-free chamber temperature control and a noble gas purification model, both of which ensure superior results AMAT Centura 5200 is also compliant with environmental regulations, comes with easy maintenance and service through remote diagnosis, and can be customized to meet customer requirements. This is just a brief overview of what APPLIED MATERIALS Centura 5200 is capable of: an advanced semiconductor wafer fabrication reactor with superior speed and performance, versatile load systems, high precision, and a wide range of process controls. It's an ideal choice for modern semiconductor fabrication needs.