Used AMAT / APPLIED MATERIALS Centura 5200 #188648 for sale

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ID: 188648
Vintage: 1999
RTP annealing system Software version: B6.20a System power rating: 208 VAC, 3 phase Loading configuration: narrow body dual auto-indexer loader Ch position A: ATM RTP XE chamber N2, O2 Ch position B: ATM RTP XE chamber N2, O2 Ch position D: single wafer cooling chamber N2 Ch position F: single wafer cooling chamber N2 Configuration: (1) AMAT CENTURA 5200 standard mainframe body (1) AMAT CENTURA 5200 mainframe transfer chamber (2) Narrow body load lock chambers (2) RTP XE chambers (1) HP+ robot wafer handling assembly (1) System controller / AC power box (2) CRT monitor with light pen Remote components: (2) Ebara dry pumps, A30W Bay Voltax heat exchanger No equipment manuals Currently installed 1999 vintage.
AMAT / APPLIED MATERIALS Centura 5200 is a high-performance and reliable electron beam reactor used in semiconductor chip production. This chamber-type reactor is designed specifically to handle rapid throughput, tight process control parameters, maximum yield, and demanding production cycles. AMAT Centura 5200 features a one-piece end-view chamber that is placed inside a vacuum enclosure, with the body and the electrical components, such as the power supplies, heating elements, pressure gauges, and the chamber door, placed above it. The one-piece chamber body is made from stainless steel, which is specifically designed to protect the semiconductor chips from contamination from airborne particles and reactive species. The chamber of APPLIED MATERIALS Centura 5200 is filled with an inert gas such as nitrogen, which is then heated to a temperature of up to 400 degrees Celsius. This temperature increases the pressure of the gas to around 1.2 torr. The gas is then exploded within the chamber by an electron beam gun. The explosion within the chamber creates a plasma that is suitable for processing, etching, and deposition of films and materials onto the semiconductor chip. The boiler is an assembly of two separate elements, a motorized outside cylinder and a dielectric manifold, which help to control the RF field distribution inside the chamber and ensure optimum uniformity. The inside cylinder is held in place by ceramic supports that ensure low electrical losses, which help the plasma uniformity and maintain consistent wafer uniformity. The electron beam gun at the back of the chamber is used to ignite the process gas, and the RF energy is then applied to the wafer. In order to control the process parameters, Centura 5200 offers a range of different power supply options that allow for high levels of accuracy and precision. AMAT / APPLIED MATERIALS Centura 5200 reactor is capable of delivering peak temperatures of over 1000° Celsius with a sharp temperature profile to ensure that the process takes place at the right speed. The process uniformity and wafer uniformity of AMAT Centura 5200 are among the highest in the industry. Overall, APPLIED MATERIALS Centura 5200 is an advanced, high-performance and reliable electron beam reactor capable of providing highly reproducible and reliable semiconductor manufacturing with better yields and reduced production times. It is designed to take on the most demanding semiconductor production requirements and offers a higher level of process precision and process control.
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