Used AMAT / APPLIED MATERIALS Centura 5200 #189437 for sale

AMAT / APPLIED MATERIALS Centura 5200 is an advanced semiconductor production reactor designed for use in high-capacity manufacturing lines. The reactor is built on the popular Centura platform and is used in wafer fabrication to deposit films and oxides on silicon wafers. AMAT Centura 5200 is highly customizable and can be configured for different types of processes, such as chemical vapor deposition (CVD), physical vapor deposition (PVD), and atomic layer deposition (ALD). It is designed to produce ultra-thin film structures on a variety of substrates, including 3D memory structures, sensors, photonics, and microelectronics. The core of APPLIED MATERIALS Centura 5200 consists of an advanced process chamber and an efficient imaging equipment. The process chamber is equipped with a turbomolecular pump, proportional valves, direct feed gas mixing, spectrometer, and other tools. These capabilities enable the system to accurately monitor the deposition process in real time and make sure the resulting layers have the desired thickness and uniformity. The imaging unit of Centura 5200 is one of its most defining features. It is powered by a high-resolution camera and has the ability to perform complete image analysis of the layers deposited in the chamber. The machine tracks the effect of deposition parameters on the final structure, allowing the operator to make adjustments in real time to ensure the best possible results. In terms of performance, AMAT / APPLIED MATERIALS Centura 5200 offers several advantages compared to other reactors in its class. It has lower power consumption and higher throughput, enabling it to handle larger product batches in less time. The tool is also highly reliable, capable of performing operations for extended periods without any downtime or maintenance. Additionally, the asset can be combined with other tools and systems to further improve the overall performance of the production line. Overall, AMAT Centura 5200 is an extremely versatile reactor designed to meet the needs of high-capacity semiconductor production lines. Its precision imaging model, customizable process chamber, and extensive capabilities make it a reliable and efficient solution for depositing ultra-thin films on a wide range of substrates.