Used AMAT / APPLIED MATERIALS Centura 5200 #200144 for sale

AMAT/AMAT / APPLIED MATERIALS Centura 5200 is a multi-chamber reactor equipment that delivers integrated etch and deposition capabilities for advanced semiconductor device fabrication. It combines process flexibility, automated performance and high throughput, making it well-suited for high-volume production applications. This system is capable of providing a variety of etching and deposition processes, including chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD), atomic layer deposition (ALD) and more. It can also operate in both vertical and horizontal orientations, allowing for greater flexibility in the area of process integration. The unit is comprised of a three-chamber configuration, with the upper chamber housing the sources and source holders, the middle chamber having the main process chamber, and the bottom containing the exhaust machine. The process chamber is the heart of the tool and is contained within a vacuum-sealed enclosure of niobium, titanium and stainless steel. This chamber is designed to operate between 5 to 10 mTorr, allowing for a wide range of processing parameters. The chamber features an adjustable quartz susceptor designed to provide uniform deposition and an enhancement kit is included to provide improved reactive ion etching (RIE) performance. One of the most impressive features of AMAT Centura 5200 is its advanced automation capabilities. This asset is capable of controlling processes and recipes with precise accuracy, ensuring that the desired performance is achieved. The automation model also allows for remote maintenance support, enhancing process control and eliminating the need for personnel in the cleanroom. Additionally, the modular design of the equipment allows it to easily adapt to new process requirements and key components are available in multiple configurations, making the system more efficient and versatile. Overall, APPLIED MATERIALS/APPLIED MATERIALS Centura 5200 is an impressive and reliable unit for high-volume production applications. It provides automated performance, precision and high throughput and offers a variety of etching and deposition processes. It is also versatile, energy-efficient and contains advanced automation capabilities, making it a popular choice for all types of advanced semiconductor device fabrication.