Used AMAT / APPLIED MATERIALS Centura 5200 #293607517 for sale

ID: 293607517
Wafer Size: 8"
Vintage: 1997
System, 8" 1997 vintage.
AMAT / APPLIED MATERIALS Centura 5200 is an advanced semiconductor device manufacturing equipment specifically designed for copper applications. It is a dry etch reactor system comprised of an Integrated Reactor Subsystem (IRS) and a Multi-Reactor Subsystem (MRS). The IRS is comprised of two reactors, the Upper Reactor and the Lower Reactor and can be configured to process up to four hundred different products. The MRS is comprised of four additional independent reactors, two in a single configuration, allowing for high- and low-volume production of wafers. The Upper Reactor is a metal and silicon oxide etch reactor designed to precisely remove metal, oxide, nitride and other films without damage to the underlying substrate. It is an etch-in-flow unit utilizing high-rate pulses in the chamber, ensuring uniform etching of films with a high degree of control. The Lower Reactor is capable of both standard etching and high-density plasma etching processes, providing high-aspect-ratio features with high process repeatability and yields. The machine offers an intuitive automated software module with built-in recipes and process optimization through real-time product feedback. Additionally, the tool has an advanced diagnostics, process routines and maintenance plans that allow for fast error identification and correction. The asset is highly reliable, efficient and cost-effective, making it a great asset for semiconductor device manufacturing. AMAT Centura 5200 is a superior dry-etch reactor model for copper applications in the semiconductor device manufacturing market. Its multiple reactors provide users with versatile etching capabilities and process repeatability. Additionally, its advanced diagnostics, process routines and maintenance plans make it a highly efficient equipment, offering great value to its customers.
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