Used AMAT / APPLIED MATERIALS Centura 5200 #9004510 for sale

ID: 9004510
Wafer Size: 8"
CVD System, 8" (3) Chambers W x Z Process.
AMAT / APPLIED MATERIALS Centura 5200 is a reactor that is used for a variety of applications in the semiconductor industry. It is specifically designed to produce high-yield, defect-free substrates of materials such as silicon, gallium arsenide, and polysilicon. The main components of AMAT Centura 5200 are the furnace, main chamber, and the process chamber. The furnace is the main power center of the equipment and is used to control the temperature of the system as well as provide the necessary power for processes requiring high temperatures or vacuum. The main chamber is the main area of the unit where the substrate is placed for processing. It also contains some of the instrumentation and controls required for the operation of the machine. The process chamber is located within the main chamber and contains all the equipment required for the actual processing of the substrate. APPLIED MATERIALS Centura 5200 can perform a variety of processes, from dopant implant to epitaxial growth, photoresist stripping, and etching. It also supports advanced process flows such as atomic layer deposition (ALD) and chemical mechanical planarization (CMP). The tool has an extensive library of recipes and recipes can be customized for specific applications. Centura 5200 is a fully integrated asset with advanced controls and technologies. It features a user-friendly human-machine interface (HMI) that allows easy access to the model settings and recipes. The equipment also features low thermal gradient control and improved temperature stability, allowing for greater repeatability and accuracy. AMAT / APPLIED MATERIALS Centura 5200 is an excellent choice for many applications in the semiconductor industry, providing high-yield, defect-free substrates and advanced process flows. It is a reliable, versatile reactor system and is backed by AMAT commitment to quality and innovation.
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