Used AMAT / APPLIED MATERIALS Centura 5200 #9061043 for sale

Name: AMAT / APPLIED MATERIALS Centura 5200
Brand: AMAT / APPLIED MATERIALS
SKU: 9061043
Availability: InStock

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Reactors

Manufacturer

AMAT / APPLIED MATERIALS

Model

Centura 5200

ID: 9061043

Wafer Size: 8"

Vintage: 1996

Etcher, 8" Cassette nest plastic, 8" Wafer shape: SNNF (Semi notch no flat) System information: Platform type: Centura (3) Process chambers SECS / GEM: Yes Chamber location / Type / Current process: Position A / MxP / Poly etch Position B / MxP / Poly etch Position C / MxP / Poly etch Position F / Orienter (Laser assy not available) Etch chamber: Chamber type: MxP Wafer clamp: Polyimide ESC BS He cooling: Yes He dump line: Yes Turbo pump: SEIKO STP-301CVB Endpoint type: Stand alone Monochrometer: Per chamber Generator model: ENI OEM-12B3 Max power: 1250w Lid temp control: PID Control Gate valve: Heated gate valve Matcher: SMA-1000 Process manometer: MKS 1Torr Gas panel: Manual valve: Yes Transducer: Yes Transducer displays: Yes Regulator: Yes Filter: Yes Gas panel facilities hook up: Single line drop bottom feed (Left side) Exhaust: Top Gas panel door interlock: Yes Gas panel exhaust interlock: Yes Gas panel pallet: Corrosive gas line: (2) Lines per chamber Inert gas line: (6) Lines per chamber MFC type: STEC SEC-7440MC Gas line (gas name, MFC size) ChA Line 1: CL2 / 80 / SEC-7440 Line 2: HBR / 100 / SEC-7440 Line 3: NF3 / 100 / SEC-7440 Line 4: CHF3 / 70 / SEC-7440 Line 5: O2 / 40 / SEC-7440 Line 6: CF4 / 100 / SEC-7440 Line 7: Ar / 100 / SEC-7440 Line 8: N2 / 100 / SEC-7440 ChB Line 1: CL2 / 83 / SEC-7440 Line 2: HBR / 100 / SEC-7440 Line 3: NF3 / 100 / SEC-7440 Line 4: CHF3 / 70 / SEC-7440 Line 5: O2 / 40 / SEC-7440 Line 6: CF4 / 100 / SEC-7440 Line 7: Ar / 100 / SEC-7440 Line 8: N2 / 100 / SEC-7440 ChC: Line 1: CL2 / 80 / SEC-7440 Line 2: HBR / 100 / SEC-7440 Line 3: NF3 / 100 / SEC-7440 Line 4: CHF3 / 70 / SEC-7440 Line 5: O2 / 40 / SEC-7440 Line 6: CF4 / 100 / SEC-7440 Line 7: Ar / 100 / SEC-7440 Line 8: N2 / 100 / SEC-7440 Mainframe: Facilities type: Regulated Loadlock type: Wide body Loadlock auto-rotation: Yes Wafer mapping type: Fast Wafer mapping sensor: Yes Cassette present sensor: Yes Transfer chamber manual lid hoist: Yes Robot type: HP Emo button: Front side Water leak detector: Yes Signal tower (front): Green, yellow, red (2) System monitor displays / controller: Front, remote Remotes: System controller & AC rack EMO button: Yes Smoke detector: Yes Line frequency and voltage: 50/60Hz, 208VAC, 3ph Remote UPS interface: Yes Generator rack EMO button: Yes Smoke detector: Yes Water leak detector: Yes Heat exchanger type: For wall: RISSHI CS-400SW-2 (0 - 80°C) For cathode: RISSHI CS-400SW-2 (0 - 80°C) Pumps type: LL Chamber: EBARA A30W Transfer chamber: EBARA A30W Ch A: EBARA A30W Ch B: EBARA A30W Ch C: EBARA A30W Gas scrubber: EBARA GTE-3 1996 vintage.

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AMAT / APPLIED MATERIALS Centura 5200 is a high-performance reactor specifically designed for the production of cutting-edge semiconductors. It combines advanced deposition technologies with integrated automation capabilities for optimal process flexibility and control. AMAT Centura 5200 features a unique hybrid-deposition chamber design which facilitates aggressive process procedures, allowing for both low-temperature and high-temperature reactions. This allows users to process faster, owing to the hybrid-deposition method which increases throughput by reducing the downtime associated with exchanging chambers. This reactor allows users to produce more uniform and consistent films with higher throughput. APPLIED MATERIALS Centura 5200 also has a number of processes available and customizable software that allows users to customize the product to their specific requirements. Users can use this software to customize deposition recipes and process flows, optimally tuning the reactor's functionalities to their needs. This also allows users to quickly modify and repeat processes for improved process optimization and reliability. Centura 5200 reactor features a sophisticated remote diagnostics system that allows for quick and easy service and troubleshooting. The integrated automation controls and diagnostic system provide users with the flexibility needed for a variety of tasks, from R&D to production. These flexible controls also enable users to maximize throughput rates and monitor process parameters in real time. In addition, AMAT / APPLIED MATERIALS Centura 5200 reactor is designed with safety in mind. It features a wide array of safety and environmental safeguards, including protective guards and chamber interlocks, to ensure that the reactor is operated in compliance with the environmental regulations. AMAT Centura 5200 is an advanced reactor with a wide range of features, thus making it one of the best high-performance reactors on the market. Its advanced deposition chamber design, integrated automation capabilities, and flexible controls make it an ideal solution for a variety of tasks, from R&D to production.