Used AMAT / APPLIED MATERIALS Centura 5200 #9071275 for sale

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ID: 9071275
Wafer Size: 8"
Epi Reactor, 8" Application: Sige Bipolar/BICMOS Chamber type | Selected option: Chamber A: (RH) Reduced pressure EPI Chamber B: (RH) Reduced pressure EPI Chamber C: (RH) Reduced pressure EPI Chamber D: Empty Chamber E: Empty Chamber F: (CA) Single slot cooldown EMO Guard ring Chamber A/B/C: Thickness control options: Accusett 2 Recipe control software: No Third manometer: P/N 0220-35949, 200 Torr Gas line isolation: Yes Leak check port: None RGA port and valve: None Gas delivery options: ATM Capability in GP Only: No Gas panel type: Configurable Gas panel exhaust: Chamber B side MFC: P/N: 0221-18389, Unit 8561 MFC's Filter: Millipore Pump purge: Yes Chamber A/B/C Gas Option: SiHCl3: Not applicable SiH2Cl2: Yes SiH4: Yes GEH4: Yes Direct inject dopant: 2 Mixed dopant 1: Yes Mixed dopant 2: Yes Mainframe: Loadlock type: P/N: 0220-35948 Narrow body load locks with tilt-out WBLL Equalization: No Cassette platform type: Universal Common chamber options: Variable speed blower: Yes SW Monitor quartz pyrometer kit: 3 Lamps type: Ushio log life Susceptors: Tabbed susceptor Brands: Toshiba Lift pin type: Hollow silicon carbide Susceptor support shaft: NCP Susceptor support shaft Tips: Silicon carbide removable tips Exhaust inserts: Stainless steel Lower liners: Non-vented Pump isolation valve: No Exhaust deposit reduction: N/A Transfer chamber: Wafer sensing: On the fly cneterfinding Transfer chamber lid hoist: Yes Robot: HP + ENP Transfer chamber purge, 15 SLM: Yes Diagnostics and control: SECSTrace: Yes Vacuum pumps: Pump brand: Edwards Loadlock chamber pump: Edwards iQDP40 Transfer chamber pump: Edwards iQDP40 Proces chamber pump: Edwards iH1000 Monitors: (1) Through the wall and (1) Table mount Manual Set Tools and kits: Centura HT Temp profiling kit Upper dome centering ring kit HT Level 1 Consumable kit (2) Additional Level 1 consumable kit Additional Epi quartz and graphite spares: (2) Reduced pressure upper dome (2) Lower dome (4) Spare susceptors (4) Preheat rings Manually input spare: P/N: 3920-01120, 10-120 lb-in torque wrench 480 V with transformer, 60 Hz, 600 A Currently installed 2005 vintage.
AMAT / APPLIED MATERIALS Centura 5200 is a reactor equipment designed for use in advanced electroplating, etching and dielectric processing applications. It is equipped with high precision photolithographic masks for patterned processing. The system is designed to apply physical and chemical treatments over large areas of substrates quickly and efficiently. AMAT Centura 5200 is constructed with a thick stainless steel outer shell, which provides reliable and durable protection against corrosion and other environmental conditions. Inside the shell, state-of-the-art control modules and a robotic transport unit is employed to ensure accuracy and repeatability in the machine's processes. The tool also features an automated array of pumps, valves and other motion control components to ensure reliable and accurate delivery of materials. The asset can accommodate several types of bath configurations as well as a variety of substrate materials, making it suitable for various applications. Additionally, the user can select the appropriate batch duration and process parameters according to the material being processed. The model also supports embedded programmable logic, enabling it to monitor and control all the necessary parameters for the specific process, allowing for more control of the process conditions. The reactor offers a wide range of operating temperature from RT (room temperature) to 350°C, and the maximum flow rate of 175 l/min.; making it suitable for high speed, high accuracy plating processes. The user can also specify custom parameters such as the desired rate of evaporation, and the equipment is able to detect and store any process results for future reference. APPLIED MATERIALS Centura 5200 is a reliable reactor that is equipped with advanced technology to provide accurate, repeatable and efficient plating, etching, and dielectric processes. It can easily be configured to handle many different types of substrates and bath configurations, making it a reliable and versatile reactor.
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