Used AMAT / APPLIED MATERIALS Centura 5200 #9071275 for sale
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ID: 9071275
Wafer Size: 8"
Epi Reactor, 8"
Application: Sige Bipolar/BICMOS
Chamber type | Selected option:
Chamber A: (RH) Reduced pressure EPI
Chamber B: (RH) Reduced pressure EPI
Chamber C: (RH) Reduced pressure EPI
Chamber D: Empty
Chamber E: Empty
Chamber F: (CA) Single slot cooldown
EMO Guard ring
Chamber A/B/C:
Thickness control options: Accusett 2
Recipe control software: No
Third manometer: P/N 0220-35949, 200 Torr
Gas line isolation: Yes
Leak check port: None
RGA port and valve: None
Gas delivery options:
ATM Capability in GP Only: No
Gas panel type: Configurable
Gas panel exhaust: Chamber B side
MFC: P/N: 0221-18389, Unit 8561 MFC's
Filter: Millipore
Pump purge: Yes
Chamber A/B/C Gas Option:
SiHCl3: Not applicable
SiH2Cl2: Yes
SiH4: Yes
GEH4: Yes
Direct inject dopant: 2
Mixed dopant 1: Yes
Mixed dopant 2: Yes
Mainframe:
Loadlock type: P/N: 0220-35948 Narrow body load locks with tilt-out
WBLL Equalization: No
Cassette platform type: Universal
Common chamber options:
Variable speed blower: Yes
SW Monitor quartz pyrometer kit: 3
Lamps type: Ushio log life
Susceptors: Tabbed susceptor
Brands: Toshiba
Lift pin type: Hollow silicon carbide
Susceptor support shaft: NCP Susceptor support shaft
Tips: Silicon carbide removable tips
Exhaust inserts: Stainless steel
Lower liners: Non-vented
Pump isolation valve: No
Exhaust deposit reduction: N/A
Transfer chamber:
Wafer sensing: On the fly cneterfinding
Transfer chamber lid hoist: Yes
Robot: HP + ENP
Transfer chamber purge, 15 SLM: Yes
Diagnostics and control:
SECSTrace: Yes
Vacuum pumps:
Pump brand: Edwards
Loadlock chamber pump: Edwards iQDP40
Transfer chamber pump: Edwards iQDP40
Proces chamber pump: Edwards iH1000
Monitors: (1) Through the wall and (1) Table mount
Manual Set
Tools and kits:
Centura HT Temp profiling kit
Upper dome centering ring kit
HT Level 1 Consumable kit
(2) Additional Level 1 consumable kit
Additional Epi quartz and graphite spares:
(2) Reduced pressure upper dome
(2) Lower dome
(4) Spare susceptors
(4) Preheat rings
Manually input spare:
P/N: 3920-01120, 10-120 lb-in torque wrench
480 V with transformer, 60 Hz, 600 A
Currently installed
2005 vintage.
AMAT / APPLIED MATERIALS Centura 5200 is a reactor equipment designed for use in advanced electroplating, etching and dielectric processing applications. It is equipped with high precision photolithographic masks for patterned processing. The system is designed to apply physical and chemical treatments over large areas of substrates quickly and efficiently. AMAT Centura 5200 is constructed with a thick stainless steel outer shell, which provides reliable and durable protection against corrosion and other environmental conditions. Inside the shell, state-of-the-art control modules and a robotic transport unit is employed to ensure accuracy and repeatability in the machine's processes. The tool also features an automated array of pumps, valves and other motion control components to ensure reliable and accurate delivery of materials. The asset can accommodate several types of bath configurations as well as a variety of substrate materials, making it suitable for various applications. Additionally, the user can select the appropriate batch duration and process parameters according to the material being processed. The model also supports embedded programmable logic, enabling it to monitor and control all the necessary parameters for the specific process, allowing for more control of the process conditions. The reactor offers a wide range of operating temperature from RT (room temperature) to 350°C, and the maximum flow rate of 175 l/min.; making it suitable for high speed, high accuracy plating processes. The user can also specify custom parameters such as the desired rate of evaporation, and the equipment is able to detect and store any process results for future reference. APPLIED MATERIALS Centura 5200 is a reliable reactor that is equipped with advanced technology to provide accurate, repeatable and efficient plating, etching, and dielectric processes. It can easily be configured to handle many different types of substrates and bath configurations, making it a reliable and versatile reactor.
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