Used AMAT / APPLIED MATERIALS Centura 5200 #9116514 for sale

AMAT / APPLIED MATERIALS Centura 5200 is a high-performance chemical vapor deposition (CVD) reactor designed to create high-quality films and device structures used in the semiconductor industry. It is capable of depositing copper, tantalum, tungsten, and other films on wafers up to 200mm in diameter. AMAT Centura 5200 boasts a capacity of up to 28 wafers, simultaneous substrate heating and uniformity of up to ±3°C across the substrate. The CVD reactor is equipped with a high-performance LaB6 (lanthanum hexaboride) thermally-protected source, as well as an advanced shutter control, dual-gas capability, and pulse flow rate control to provide the temperature and uniformity necessary for high-performance CVD films. APPLIED MATERIALS Centura 5200 is designed to provide uniform film deposition and uniformity across the wafer, providing the necessary uniformity for the deposition of high quality films with the smallest possible variation from wafer to wafer. Centura 5200 is also equipped with several process monitoring tools, ensuring accurate and repeatable film deposition. These include a real-time optical emission spectroscopy (RTOES) system, which provides information about the plasma environment during process cycles, and an ion collection system, which measures the emission spectrum of the ions in the environment. The data collected by these systems can be used to accurately monitor the deposition process and make adjustments as needed to ensure high-quality films. In addition, AMAT / APPLIED MATERIALS Centura 5200 is equipped with a gas-flow controller and a vacuum-leak detector system to prevent the potential of deposition errors caused by the exposure of the substrate to atmospheric concentrations of reactive chemicals. AMAT Centura 5200 also includes a vast array of computer-controlled instruments and data-processing tools that makes the integration and control of complex CVD processes simpler and faster. Overall, APPLIED MATERIALS Centura 5200 is designed to be a high-performance CVD reactor for the semiconductor industry, with a broad range of features, including fine process control capabilities, simultaneous dual gas deposition, and particle collection and monitoring. Its advanced features are intended to provide a uniform and repeatable deposition environment, thus ensuring the production of high-quality films.