Used AMAT / APPLIED MATERIALS Centura 5200 #9145240 for sale

AMAT / APPLIED MATERIALS Centura 5200 is a high performance dielectric etch reactor utilizing plasma etching technology to enable high-throughput semiconductor manufacturing. This equipment provides a highly controlled, low-temperature, high-density plasma environment for etching delicate features in advanced dielectric material layers. The system is comprised of a high-performance vacuum chamber that is capable of achieving process pressures of up to 5 Torr. This chamber is powered by an RF power supply, allowing for the creation of a high-density plasma to etch through intricate structures in the dielectric layer. The design of the chamber also allows for rapid evacuation, allowing the unit to achieve quick process times and increased yields. A proprietary gas injection machine allows the creation of mixtures of gasses that are conducive to plasma etching of different dielectric material types. By controlling the mixture of gasses, combined with the power of the plasma and the temperature of the chamber, this tool is capable of etching through some of the most demanding dielectric layers. The process is further enhanced by non-asset components such as the high resolution optical (HROS) and shadow mask systems. These allow for the creation of high resolution features with minimal distortion, which is a must for the fine-tuning processes involved in dielectric layer fabrication. In addition to the plasma etching process, the Chamber also provides an environment that is compatible with resist stripping processes. This enables the removal of resist material, allowing for the precise formation of metal and dielectric components, which is critical for advanced semiconductor device fabrication. AMAT Centura 5200 provides highly precise and consistent processes for etching delicate dielectric layers. Through the combination of advanced technologies and precise controls, this model allows for improved process yields and throughput without compromising on quality. This equipment is a crucial tool in the advancement of modern semiconductor fabrication processes.