Used AMAT / APPLIED MATERIALS Centura 5200 #9182239 for sale

AMAT / APPLIED MATERIALS Centura 5200 is a highly advanced reactor used for chemical vapor deposition (CVD) of silicon wafers at various temperatures and pressure levels. This reactor features a unique dual-affiliate cell design which offers superior uniformity and homogeneity of the deposited materials. This reactor is equipped with multiple components to support the most advanced CVD processes. This includes a multi-zone linear heater power supply, multiple gas sources and controls, multiple RF and microwave sources, a vacuum system, and a four-stage pressure controller. This reactor also contains a fixed susceptor, allowing for excellent temperature uniformity on the wafer. AMAT Centura 5200 offers two different chamber types, either a circular or rectangular chamber. Each chamber is able to accommodate up to sixteen 2-inch or four 8-inch wafers and can withstand temperatures up to 1200°C. This allows for the deposition of materials such as silicon dioxide, silicon nitride and silicon carbide without any thermal degradation. The reactor can be operated in either manual or fully automated modes wherein the user can control parameters such as the pressure, flow rates, and time for each process. This makes the reactor capable of providing repeatable and consistent process results. For process monitoring and control, APPLIED MATERIALS Centura 5200 features in-situ diagnostics, including quartz oscillator and quadrupole mass spectrometer (QMS). AMAT can also be integrated with a full suite of process control software for process optimization and programmable recipes. Centura 5200 is designed to provide uniform deposition rates and a consistent refractive index of deposited materials. With its compact and reliable design, it is an excellent choice for semiconductor process integration and advanced materials research applications.