Used AMAT / APPLIED MATERIALS Centura 5200 #9184781 for sale

AMAT / APPLIED MATERIALS Centura 5200 is a single-wafer, multiple-die, inductively coupled plasma (ICP) low-pressure chemical vapor deposition (LPCVD) type reactor designed for the fabrication of nanoscale solid-state components utilized in a variety of semiconductor device applications. It has a flexible process chamber that can be configured for the deposition of a wide range of films, including Silicon (Si) films, Nitride films, and Neutral Silicon films. It also features a high-powered RF generator which allows the operator to precisely control the concentration of ions in the plasmas. AMAT Centura 5200 is a multi-tool reactor that can offer superior deposition uniformity and process control yields for the production of semiconductor die for advanced technology nodes. The reactor reduces the cost of ownership with an easy to use intuitive user interface and pre-programmed recipes. The efficient automatic wafer exchange station allows for fast job switching and wafer throughputs up to 81 wafers per hour in AMAT High Throughput Mode. APPLIED MATERIALS Centura 5200 provides superior thermal management through chamber cooling and simulated thermal diffusion. This allows a high deposition rate with consistent film thicknesses over the entire substrate and fast process times. The chamber pressure is kept low with adjustable baffles, which helps the process chamber reach a higher temperature uniformity quicker. Centura 5200 is designed to achieve ultra-low defect levels with five-axis control, a laser wafer mapping system, and advanced wafer handling technique. The integrated Fast Fourier Transform (FFT) Spectroscopy technology probes the homogeneity of the substrate during the process. The advanced tool's real-time process control feature allows operators to detect deposition non-uniformities rapidly and adjust the parameters for better processing in a matter of minutes. By integrating process monitoring capabilities and flexibility, AMAT / APPLIED MATERIALS Centura 5200 allows for improved yield and throughput, as well as accelerated time-to-market, even at the most challenging nodes. This makes the tool extremely attractive to device manufacturers and research institutes for the fabrication of nanoscale components.