Used AMAT / APPLIED MATERIALS Centura 5200 #9188549 for sale
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ID: 9188549
Wafer Size: 6"
Vintage: 2005
Oxide etcher, 6"
(2) MxP+ Oxide etchers
MxP
(2) Orient chambers
Wide body load locks
2005 vintage.
AMAT/AMAT / APPLIED MATERIALS Centura 5200 reactor is a piece of next-generation manufacturing equipment that offers superior nano-scale processing technology allowing customers unprecedented flexibility and precision. AMAT Centura 5200 reactor is designed for successively increased throughput and superior device performance. It is a high throughput multi-station processing tool designed to meet the demands of advanced device manufacturing across a wide range of industries. This reactor uses advanced multi-step processing to produce a variety of highly complex wafer shapes, sizes and configurations. APPLIED MATERIALS Centura 5200 reactor is the latest in APPLIED MATERIALS line of industry leading ultra-high vacuum, chemical vapor deposition (CVD) processes. This state-of-the-art CVD process uses integrated decentralized processes to deliver superior quality, high yield wafers. Centura 5200 also features a Class 1000 clean room environment, which includes dual enclosure cleanroom systems that eliminate the need for frequent part changes, while at the same time allowing for localized evaporations, depositions and plasma-enhanced chemical vapor deposition processes. The superior throughput capabilities of AMAT / APPLIED MATERIALS Centura 5200 are driven by a full suite of automated process control systems. This includes tight control of parameters, such as pressure, temperature, gas flow, gas composition and timer functions. AMAT Centura 5200 reactor also employs the latest in advanced self-cleaning, environmental monitoring technologies. This enables dependable operation and greatly simplifies system maintenance cycles. APPLIED MATERIALS Centura 5200 reactor is a comprehensive, high-performance solution for device fabricators across a wide range of industries. It utilizes the most advanced technology available to enable superior throughput, superior device performance, and low maintenance. It is the ideal solution for device manufacturing process optimization, and it is the preferred choice for fabricators looking to build the most advanced devices of the future.
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