Used AMAT / APPLIED MATERIALS Centura 5200 #9196778 for sale
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ID: 9196778
Wafer Size: 8"
Vintage: 1996
PECVD System, 8"
Process: eMax
JMF
SMIF Interface: No
Chamber A / B / C: eMax
Chamber F: Orientor
Load lock A / B: Narrow
(6) Wafer sensors
EPD Controller
System placement: System alone
Chamber A / B / C:
RF Match: 0010-30686
RF Generator: OEM-28B
ALCATEL ATH1600M Turbo pump
Throttle valve
MKS TYPE127 1TORR Mono meter
Mainframe information:
System placement: Stand alone
Robot type: HP+
L/L Wafer mapping
Slit Valve / Plate type: Standard
Robot blade: Ceramic
W/F Slippage sensor
N2 Purge
Heat exchanger (Chiller): No
Dry pumps: No
System monitor: Stand alone
Gas panel configuration: 7 Channels
Chamber A:
CL2 / 100 Sccm / SEC-4400M
CF4 / 100 Sccm / TYLAN 2900
N2 / 100 Sccm / SEC-4400
AR / 300 Sccm / SEC-4400M
O2 / 5 Slm / SEC-4400M
CHF3 / 20 Sccm / SEC-4400M
CF4 / 100 Sccm / SEC-4400M
Chamber B:
C4F8 / 50 Sccm / SEC-7440MC
CO / 500 Sccm / SEC-7440MC
N2 / 100 Sccm / SEC-4400
AR / 200 Sccm / SEC-4400M
O2 / 50 Sccm / SEC-4400M
CHF3 / 100 Sccm / SEC-4400M
CF4 / 50 Sccm / SEC-4400M
Chamber C:
CL2 / 100 Sccm / SEC-7440MC
CHF3 / 50 Sccm / TYLAN 2900
N2 / 100 Sccm / SEC-4400
AR / 2 Slm / SEC-4400M
O2 / 5 Slm / SEC-4400M
CHF3 / 20 Sccm / SEC-4400M
CF4 / 50 Sccm / SEC-4400M
Electrical:
Line frequency: 50 / 60 Hz
Power: 208 VAC, 4 Wires, 3 Phase delta
Missing parts:
(2) Slit valves
(3) Flow sensors & coolant lines
EPD Monitor
Liner for B-ch
1996 vintage.
AMAT / APPLIED MATERIALS Centura 5200 is a high-capacity processing reactor that offers superior performance for the fabrication of integrated circuits and advanced semiconductor devices. AMAT Centura 5200 is designed with advanced automation and flexibility in mind, enabling precision and speed in the performance of complex wafer processing tasks. APPLIED MATERIALS Centura 5200 is equipped with a wide array of automated features, such as automatic wafer handling, variable position loading/unloading, automated resist and etch processes, automated laser patterning, and the ability to process up to seven wafers simultaneously. Additionally, Centura 5200 provides advanced inspection capabilities, such as automatic edge scanning and defect detection. This advanced feature set enables AMAT / APPLIED MATERIALS Centura 5200 to achieve higher levels of accuracy and throughput than traditional processing systems. AMAT Centura 5200 is capable of reliable operation under a wide range of processing conditions, ensuring consistent and predictable performance at a variety of ambient temperatures and pressures. It is also equipped with a built-in environmental monitoring system that helps operators to ensure safe and secure processing conditions. In addition, APPLIED MATERIALS Centura 5200's advanced dynamic control systems continuously monitor and adjust the reactor's internal pressure, ensuring that optimal conditions are maintained throughout the entire etch process. Centura 5200 also provides reliable and repeatable process performance by employing precise process control systems that continuously monitor and adjust gas flow and pressure levels. This system enables the precise control of reactant concentrations, as well as precise temperature and flow time settings, allowing users to achieve precise results with repeatable processes every time. Additionally, AMAT / APPLIED MATERIALS Centura 5200 features an integrated process control computer, which provides real-time data on wafer temperature and pressure, as well as other important wafer-to-wafer process parameters. AMAT Centura 5200's advanced automation and process control capabilities, combined with its robust design and construction, make it an excellent choice for high-volume etch applications. APPLIED MATERIALS Centura 5200 is capable of processing up to 7 wafers simultaneously and is guaranteed to provide reliable and repeatable results with every cycle. Its advanced automation and process control capabilities also enable the operator to efficiently and accurately control the parameters of their etch processes, ensuring consistent and predictable performance throughout.
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