Used AMAT / APPLIED MATERIALS Centura 5200 #9205664 for sale

AMAT / APPLIED MATERIALS Centura 5200 Reactor is a line of advanced oxidation-based process modules designed to offer superior performance in today's diverse semiconductor manufacturing environment. The module offers a wide range of features such as dual chamber design for improved uniformity and a high pressure capability of up to 20 Torr that is ideal for small feature sizes. Additionally, AMAT Centura 5200 provides an efficient thermal management equipment that includes a high power RF generator that ensures added stability and control in temperature balance. The reactor forms part of AMAT fully integrated Centura platform that includes a comprehensive suite of hardware, software packages and ancillaries including a manual control interface, multiple instrumentation ports, etc. for a wide variety of applications. APPLIED MATERIALS Centura 5200 provides a multi-chamber process system optimized for oxide deposition, oxide etch and CVD processes, enabling simultaneous silane downstream, nitride downstream and oxide downstream. This allows users to easily configure the reactor to their application, whether it is through the use of seamless integration with the CVC software or through the use of APPLIED MATERIALS automation packages that can be integrated with the reactor. Likewise, the unit is compatible with a wide range of hardware components that ensure increased process control and a high level of accuracy and repeatability. These components include an integrated rotating substrate support, temperature controlled modules, process controllable wafer chuck, side wall product holders and mass-flow controllers. In terms of materials compatibility, Centura 5200 is designed to be used with a wide range of materials, including SiO2, SiNx, Si, Al2O3 and W. Additionally, the reactor can be tuned to specific substrates, allowing users to achieve optimized process conditions. In addition, the machine's advanced control algorithms and integrated auto tuning functions provide advanced process uniformity with minimal variation between wafers. This ensures wafer-level 100% yield and higher device performance. In conclusion, AMAT / APPLIED MATERIALS Centura 5200 Reactor offers advanced process control, high speed operation and superior repeatability for optimized device performance in today's modern fabrication environment.