Used AMAT / APPLIED MATERIALS Centura 5200 #9206626 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 9206626
Vintage: 1998
Rapid Thermal Processing (RTP) system
LL Type: Wide body
LL Pump
LL Function test
Chamber variant: MOD II XE+ ATM
Ni Coated Centura HTF MF
Chamber position: A and B
Chiller
RTP Chamber A/B PCV / Rotation / Lift test
Chamber A/B temperature control test
O2 Sensor: CG-1000
Bottom purge
VME Controller
Center finder: OTF
Wafer mapping: Standard
Robot: Frog (HP)
Buffer chamber HP robot overhaul & test
Pyrometers: SEKIDENKO
Rotation: 90 RPM (Bearings)
Cooldown: (2) Standard cool
MFCs:
N2: 10SLM
O2: 1SLM
Ar: 10SLM
O2: 10SLM
N2-BPSG: 20SLM
1998 vintage.
AMAT (APPLIED MATERIALS) AMAT / APPLIED MATERIALS Centura 5200 is a thermal processing reactor designed for semiconductor wafer fabrication processes. The reactor offers high-volume throughput, low cost of ownership and precise process control capabilities. It provides an ideal platform for creating a safe and efficient environment for semiconductor production. AMAT Centura 5200 is driven by an advanced Quad-Core processor and incorporates a sophisticated Automated Process Control (APC) system. APC delivers a dynamic pathway for rapid recipe development and recipe management. It also enables continuous, closed-loop control of the process to reach optimal process results, in terms of yield and product quality. APPLIED MATERIALS Centura 5200's thermal control is loaded with advanced features, such as the Quad-Flow uniformity system. This advanced feature ensures that the process temperature is evenly distributed across the susceptor. This ensures a uniform and repeatable process. The chamber also features Electrostatic Chuck (ESC) top plates, which secure the wafers during processing, eliminating die-to-die and die-to-chamber non-uniformity. Centura 5200 also features a PECVD chamber for providing a low temperature, high throughput solution for growing thin films. The PECVD chamber offers a wide range of selectable options, from Al and SiOx films, to TaN films and polysilicon films. The chamber also has the capability to grow films of different structures and thicknesses, for example for the fabrication of multiple layers of thin films. AMAT / APPLIED MATERIALS Centura 5200 can be integrated into a full automated production line, making it ideal for medium and high volume production. The reactor is wired for four-wire control, allowing the Centura to integrate with most process robots. Its advanced vacuum system ensures a high throughput, minimizing process time and achieving optimum process results. In summary, AMAT Centura 5200 is a state-of-the-art thermal processing reactor offering precise process control, high throughput, and cost savings in wafer fabrication processes. Its advanced features and integration capability make it a perfect solution for medium and high volume production lines.
There are no reviews yet