Used AMAT / APPLIED MATERIALS Centura 5200 #9221091 for sale

AMAT / APPLIED MATERIALS Centura 5200 is a highly efficient and reliable reactor that is used for various semiconductor manufacturing processes. It combines a unique set of process technologies with predictable and repeatable results, so that it can deliver superior performance. It features a high throughput performance and is designed to ensure fast and consistent wafer production. AMAT Centura 5200 is a single-wafer significantly integrated chemical vapor deposition (CVD) equipment based on Advanced Low-Pressure PECVD technology. It is a universal reactor system, that can be configured to perform a wide range of process chemistries and gas delivery, as well as varying deposition rates and chamber sizes. The unit offers industry-leading lower pressure CVD capabilities, and is designed to enable a wide variety of thin-film deposition and etch applications. The PECVD process module combines a number of proprietary process control technologies that offer the highest level of precision and repeatability. This enables higher yields of the highest quality CVD thin-film deposition. APPLIED MATERIALS Centura 5200 is further enhanced with advanced control technologies that enable users to control the deposition process from start to finish. This includes advanced wafer tracking technology that provides users with enhanced process and yield control, as well as greater throughput. Centura 5200 is also equipped with a completely automated thermal management machine for improved product integrity. The tool is capable of supporting up to 2000 wafer per hour throughput and the usual substrates such as Si, SiC, Co, W and Ta. All in all, AMAT / APPLIED MATERIALS Centura 5200 is an advanced, reliable and efficient reactor and is suitable for a wide range of CVD applications. It provides superior performance, repeatability and high yields.