Used AMAT / APPLIED MATERIALS Centura 5200 #9251052 for sale

AMAT / APPLIED MATERIALS Centura 5200 is an advanced low-pressure, single-wafer reactor equipment designed to deliver high-quality plasma-based thin-film deposition for advanced microelectronic, MEMS, and optoelectronic applications. The system leverages proven AMAT processing technology to deliver uniform, defect-free film deposition for time-critical process steps such as gate etch or deposition of protective or planarizing layers. AMAT Centura 5200 is equipped with a variety of deposition sources including electron cyclotron resonance (ECR) or inductively coupled plasma (ICP) sources, along with a high-upward eddy-current magnetic field to facilitate uniform and repeatable film deposition. This unit utilizes a highly modular, scalable design to enable multiple source configurations. A variety of source customizations are available to facilitate the deposition of specific thin film layers and features. The machine boasts an exceptionally high throughput rating of 500 wafers/hour, helping to maximize production efficiency. In addition, its advanced substrate temperature control capability helps to minimize thermal stresses and ensure consistent and repeatable results, even for delicate substrates. This temperature control helps APPLIED MATERIALS Centura 5200 take the guesswork out of temperature-sensitive applications and minimizes the number of process steps. The tool also features an integrated Plasma Control Asset (PCS) for reliable control of the plasma source, allowing for precise tuning and fine-tuning of process parameters. With integrated end-point monitoring, users can monitor and analyze various parameters such as gas consumption, pressure, RF power, and temperature during the deposition process. This helps to ensure that the process is held to the highest standards and keeps the model running at peak performance. For additional convenience, Centura 5200 includes an integrated load lock which allows the equipment to operate in a batch production environment. This load lock, along with its high-throughput capabilities, make AMAT / APPLIED MATERIALS Centura 5200 an ideal choice for advanced production environments looking to scale their production outputs quickly and efficiently. Overall, AMAT Centura 5200 is an excellent choice for a wide range of deposition applications. Its scalability and flexibility, combined with its advanced plasma control, high throughput, and temperature control capabilities make it the perfect choice for demanding production applications in the microelectronics and optoelectronics industries.