Used AMAT / APPLIED MATERIALS Centura 5200 #9253559 for sale

AMAT (APPLIED MATERIALS) AMAT / APPLIED MATERIALS Centura 5200 reactor is a advanced process chamber for oxide, nitride, and other materials. This reactor is used mainly for semiconductor and advanced packaging device fabrication, and is one of the most popular and versatile reactors for these fields. It has multi-purpose capabilities and offers advanced capabilities for superior production yields. AMAT Centura 5200 reactor is a highly flexible, advanced process chamber with a maximum processing chamber capacity of 2.5-16 cubic feet and greater than 0.1 mTorr pressure rating. It features a variety of process capabilities, including plasma-enhanced chemical vapor deposition (PECVD), atmospheric and low-pressure chemical vapor deposition (APCVD and LPCVD), high and low-temperature anneal, and rapid thermal processing (RTP). It is equipped with a patent-pending "Cool Edge" feature for reduced thermal stress on the process substrate and an integrated dual-micrometer substrate-leveler and contact systems for enhanced substrate-leveling accuracy. It also features a comprehensive suite of additional features and benefits, such as: Adaptive tune-up automated chamber optimization system, Precision substrate-leveler with integrated dual-micrometer contact system, Dual port pumping station, Self-contained power supply, and Gas delivery system with Ultra-Flow technology. It is designed to meet the production needs of a full range of semiconductor devices, such as: single-crystal wafers, MEMS, CMOS, ICs, and other advanced packaging devices. The enhanced process performance and reliability of APPLIED MATERIALS Centura 5200 reactor improves the overall yield and process consistency, allowing for the production of more reliable products. Its compact design and ease of use make it ideal for both research and production applications. Its reliable performance and wide range of process capabilities make it the perfect choice for a modern semiconductor manufacturing environment.