Used AMAT / APPLIED MATERIALS Centura 5200 #9256948 for sale

AMAT / APPLIED MATERIALS Centura 5200 is a plasma-based reactor designed for advanced plasma-enhanced vapor deposition processes. The reactor is utilized for thin film layer deposition on various substrates. The reactor is equipped with a precision source gas delivery system, which is capable of providing unparalleled levels of control and precision during the deposition process. The source gas is used to create a uniform plasma environment in the process chamber, allowing precise control of the deposition rate, temperature, and uniformity on the substrate material. AMAT Centura 5200 features an automated chamber geometry design that reduces the time needed for cleaning and maintenance, whilst also minimizing the need for manual alignment. It is also equipped with an integrated plasma generator, which pushes the substrate and other components through a precise pre-heating and post-heat-treatment zone, ensuring that all materials used during the deposition process are properly treated and pre-heated before the deposition occurs. The reactor is equipped with advanced feedback control systems, allowing the user to monitor the on-going process parameters and allowing them to adjust the precision of the process as needed. The feedback also allows the user to set process-specific parameters, resulting in more consistent and repeatable results from the reactor. The advanced plasma generator ensures a uniform plasma environment throughout the process chamber, resulting in a highly uniform deposition rate. APPLIED MATERIALS Centura 5200 is designed for highly intricate processes such as those involving large, complex substrates and multi-layer stack geometries, making them suitable for advanced nanostructure and MEMS applications. The ability to run multiple process modules within the same chamber ensures high throughput, with high repeatability; in addition, the automated chamber geometry ensures that the user can perform complex three-dimensional deposition tasks quickly and accurately, while also providing a compact physical footprint. Finally, Centura 5200 is a high-end reactor, with a host of non-standard features that make it perfect for advanced and innovative applications. The integrated source gas delivery system, automated chamber geometry, and advanced plasma generation enable unparalleled control and precision during the deposition process, while the modular design makes it easy to alter or upgrade system functions as required. All combined, these features make AMAT / APPLIED MATERIALS Centura 5200 an ideal choice for advanced thin film deposition and nanostructures.