Used AMAT / APPLIED MATERIALS Centura 5300 Omega #293642211 for sale

AMAT / APPLIED MATERIALS Centura 5300 Omega
ID: 293642211
Wafer Size: 8"
HDP System, 8" (2) Chambers Gas: SiO2.
AMAT / APPLIED MATERIALS Centura 5300 Omega is a advanced deposition reactor designed for low-k dielectric CVD applications that are done in advanced semiconductor processing. This reactor is designed with the specific purpose of providing high throughput and accuracy for engineers who need to fabricate intricate components. AMAT Centura 5300 Omega features advanced temperature control technology along with precise gas distribution capabilities. It consists of a temperature-controlled substrate stage, which provides precise and uniform deposition of the desired film. This process allows for extremely fast cycle times due to its ability to heat the substrate to a precisely defined process temperature in as little as 10 seconds. Furthermore, precise gas distribution ensures that every single substrate receives homogeneous amounts of the required deposition gasses, which leads to increased yields in production. Additionally, APPLIED MATERIALS Centura 5300 Omega delivers precision for all applications by utilizing a proprietary combination of advanced technology and sophisticated process control systems. The whole unit is comprised of a high-convection LPCVD chamber, cutting-edge PECVD reactors, and both safety and environmental monitoring systems. This combination allows for higher yields and better predictability. Centura 5300 Omega also brings improved productivity to environments with its combination of a rugged, wastewater-safe construction and user-friendly interface. The reactor's watertight design and stainless-steel components keep the environment free of materials contamination and its multiple loading chambers can easily be swapped out while the equipment is in operation. For improved speed and accuracy, the reactor also features a touchscreen display that gives operators real-time information on chamber conditions and allows them to monitor and control the process. Lastly, AMAT / APPLIED MATERIALS Centura 5300 Omega reactor is designed for the most sensitive applications, providing high levels of accuracy and repeatability. To do this, it employs a low-k dielectric CVD technology to prevent negatively charged particles from causing defects in chips, and a proprietary system of proprietary process control that keeps track of process parameters and adjusts them for improved accuracy. In conclusion, AMAT Centura 5300 Omega reactor is a high-throughput, low-risk, and precise deposition unit specifically designed for applications that require the highest degree of accuracy. Its temperature control machine, gas distribution capabilities, rugged construction, user-friendly interface, and process control tool make it a reliable and efficient choice for advanced semiconductor processing.
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