Used AMAT / APPLIED MATERIALS Centura ACP P3i #9211673 for sale

AMAT / APPLIED MATERIALS Centura ACP P3i
ID: 9211673
EPI System.
AMAT / APPLIED MATERIALS Centura ACP P3i is an advanced plasma reactor designed for use in semiconductor processing. It features an anchored multi-electrode array to deliver etch and deposition rates with total process control and precision. The reactor uses a unique plasma chamber design to allow plasma density to be optimized at any given rate or power level, ensuring uniformity and repeatability even at high power levels. AMAT Centura ACP P3i is capable of supporting a variety of plasma-based processes; including etching, deposition, and deposition-etching. It is capable of supporting low-k dielectric etching, SiGe selective and blanket deposition, and can realize higher SRAM density with faster memory cell formation for improved device yield and reliability. APPLIED MATERIALS Centura ACP P3i uses advanced plasma source technology with advanced diagnostics and control systems for process control and optimization. It is capable of achieving the most challenging results such as low etch rates, high deposition rates and short cycle times. Centura ACP P3i is equipped with a high-efficiency electrode distribution which helps to minimize undercutting, thereby improving process quality. The reactor's mass flow equipment provides accurate gas flow throughout the process, and the substrate cool system helps maintain accurate temperature. Its low power losses and low energy consumption result in a lower cost per wafer and improved production efficiency. The P3i has a robust safety unit, with fail-safe ion sources and sealed billet test hardware with NIST traceable control. The P3i is designed to meet SEMI safety standards, and it is compatible with most fab automation systems for integration with existing equipment. AMAT / APPLIED MATERIALS Centura ACP P3i is a powerful and reliable reactor that provides superb process control and repeatability. It offers a host of features and functions tailored to advanced semiconductor processing. Its advanced plasma source technology allows it to deliver precise, repeatable results even under challenging process conditions. Furthermore, its robust safety machine, cost-effective production methods, and compatibility with automation systems make it an excellent choice for advanced wafer fabrication.
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