Used AMAT / APPLIED MATERIALS Centura ACP Radiance #9055082 for sale

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ID: 9055082
Wafer Size: 12"
Vintage: 2003
RTP system, 12" (3) Chambers (A, B, D): Radiance RTP Gas, MFC full scale: N2 Frame 20000sccm/NH3 30000sccm N2O(30000)/He 5000sccm/N2 Low 500sccm O2 Low 10000sccm/O250000sccm/N2 50000sccm N2 BOT 50000sccm/He BOT 50000sccm/N2 MAG 100000sccm Parts missing: 0190-16691 Load Port 2set 0190-02506 Interlock board 0040-52348 Lamp head Equalization valve 0190-25863 FI Controller(Master) 0100-00658 Back plane board RH35M-4DK FI Fan 0150-04117 Flat cable 0040-52348 Lamp head 0190-25863 FI Controller(SLAVE) 1080-01264 Lift motor 9101-1999 Lift driver 2003 vintage.
AMAT / APPLIED MATERIALS Centura ACP Radiance is a high-performance, automated atmospheric chemical vapor deposition (CVD) reactor designed for the manufacture of advanced semiconductor and optoelectronics devices. The reactor is comprised of a quartz showerhead and cylindrical chamber, as well as a sophisticated control system. The chamber is divided into three independently controllable process zones, which allow for a wide range of processing parameters to be set and maintained. The chamber has four independently adjustable gas distributions for the delivery of process gases such as hydrogen, argon, and nitrogen, allowing for increased flexibility and control. AMAT Centura ACP Radiance uses a programmable microwave source to provide accurate and uniform plasma heating, allowing faster process times and improved film performance. The microwave source provides the flexibility to vary the power and frequency of the microwave radiation according to the process requirements. The reactor features a Programmable Thermal Management System (PTMS) which provides precise temperature control throughout the processing cycle by modulating microwave power. This helps to minimize non-uniformities arising from zone imbalances. APPLIED MATERIALS Centura ACP Radiance has an intuitive graphical user interface, making it easy to operate and program. The controller also offers real-time process monitoring with active fault protection for improved process stability and repeatability. To ensure the reactor runs at peak performance, a number of optional components may be added such as an ion source, turbo pump, and RF generator. Centura ACP Radiance provides greater throughput, better reliability, and increased yield and productivity compared to other CVD deposition systems. It is capable of creating complex features and patterns in advanced semiconductor and optoelectronic materials, making it an ideal tool for the fabrication of ultra-thin films and high-k dielectrics. It is widely used in the manufacture of thin-film transistors, integrated circuits, microelectromechanical systems, LED wafers, and other advanced electronic components.
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