Used AMAT / APPLIED MATERIALS Centura ACP-SIGE #9199635 for sale

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ID: 9199635
Wafer Size: 12"
EPI System, 12".
AMAT / APPLIED MATERIALS Centura ACP-SIGE (Atomic Capacitive Plasma-Surface Insulated Gate Etch) reactor is a specialized plasma etching system used for the production of advanced nano-scale transistors and integrated circuits. It uses an inductively coupled etch gas with an atomically precise plasma source to achieve high selectivity for etching silicon, germanium, gallium arsenide, and other insulating materials. AMAT Centura ACP-SIGE works by first applying plasma to a silicon wafer, a substrate through which an electrical current can be passed. This turns the surface of the wafer into a conductor, which enables a high amount of control over the etch process. As the etch gas passes through the system, the plasma from the surface of the wafer is energized by the etch gas, creating a highly selective etch process. The controllable plasma process then allows for extremely precise etching of the target material and the precise control of the damages caused by the etching process. In addition to controlling the etch process, APPLIED MATERIALS Centura ACP-SIGE also provides a low-cost solution to achieving maxium selectivity. The integrated gate insulation layer, which is applied to the wafer prior to etching, helps to guard against unwanted deposition or implantation across the interface, ensuring that the etch process adheres to its target area without any unintentional damage or contamination of adjacent materials. Centura ACP-SIGE also allows for a high-throughput solution, able to etch up to twelve cubic centimeters of material per minute. This means that more material can be processed in less time, increasing productivity and efficiency. Overall, AMAT / APPLIED MATERIALS Centura ACP-SIGE (Atomic Capacitive Plasma-Surface Insulated Gate Etch) reactor is an excellent tool for producing high-quality integrated circuits and transistors on a tight budget. It offers a high level of control over the etching process, low cost, and a high degree of selectivity. The ACP-SIGE's superior throughput capabilities also make it ideal for high-volume production applications.
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