Used AMAT / APPLIED MATERIALS Centura ACP #293738973 for sale

AMAT / APPLIED MATERIALS Centura ACP is an advanced production reactor designed to provide a high throughput of fabrication process capability and reliability. This system is ideal for deposition of multiple thin film layers typically used in the semiconductor and photovoltaic manufacturing industries. AMAT Centura ACP combines a quartz "cold wall" main chamber, silicon semiconductor-based hot wall susceptors, and low-thermal-load, fast-moving linear scanning. This combination of design elements acts to reduce manufacturing defects, reduce downtime, and improve product uniformity. The ACP features a five-position wafer loadlock which allows for fast and easy loading of up to five wafers at a time into the main chamber. The main chamber is cylindrical in shape and includes the hot wall susceptors, a quartz shield tube, and the Cold Wall window. The Cold Wall consists of a single piece of quartz which acts to insulate the outside of the chamber from the process gasses during operation. This wall is interchangeable for various process chemistries, and can support several process recipes at the same time. To improve process uniformity, the ACP includes a linear scanning feature which quickly translates the susceptors across the width of the process chamber. This fast-moving scan allows the substrate to receive homogeneous thermal processing, and minimizes hot spots. It also allows for finer tuning of process parameters such as power, temperature, and pressure with minimal downtime. The ACP also features stacked plasma source technology and advanced RF power generator. The plasma source technology is used to produce ions within the chamber in order to reactive thin film materials. By using two independently-configurable plasma sources, the system can create vaporized species in the chamber without creating any disruptive electron effects. The parallel RF generator enables peak power delivery of up to 30kW per gas source, ensuring reliable operation in all processes. The ACP's Multi-Thermal Zone Controller provides substantial throughput gains by precisely controlling individual zone temperatures throughout the deposition process. In addition, the ACP features PLC programming for automatic sequences and total control of process parameters. All of these features help to ensure uniform process deposition, faster cycle times, and improved yields. In conclusion, APPLIED MATERIALS Centura ACP is a reliable, high-throughput production reactor designed to give semiconductor and photovoltaic manufacturers total control over their processes. The advanced design elements allow for improved process uniformity and yield, reducing manufacturing defects and increasing overall production efficiency.