Used AMAT / APPLIED MATERIALS Centura AP AdvantEdge G2 Minos Poly #9253660 for sale

AMAT / APPLIED MATERIALS Centura AP AdvantEdge G2 Minos Poly is a plasma etch reactor that is designed to provide high productivity in both R&D and industrial etching processes. The equipment is an advanced variant of the popular Centura AP platform and is specifically engineered to deliver improved etch rates, higher particle reduction, and better overall process performance. The system utilizes an exclusive Advanced High Frequency (AHF) advanced telecommunications technology to provide superior plasma generation, uniformity, and process reproducibility with minimal stress on the substrate material. In addition, the Minos Poly features three optimized etch levels (low, medium, and high) that enable a wide range of process capabilities. The unit is powered by an AMAT-designed, 0.7ml High Density Plasma (HDP) source. This source provides excellent control over the etch chemistry, allowing for precise processing of both high-k and low-k etch recipes. Furthermore, the source offers superior process uniformity and exceptional etch rate optimization, and greatly reduces plasma-induced damage on the substrate material. This plasma etch reactor is equipped with a variety of optional accessories such as a vacuum turbo pump, shielding machine, and a recirculation tool with a 0.1 Pa base pressure. Furthermore, the Minos Poly is capable of running both DC and MF operations which allows for both directional and non- directional etch profiles. AMAT Centura AP AdvantEdge G2 Minos Poly is compatible with a wide variety of etch recipes, featuring advanced control and monitoring capabilities with both manual and semi-automated controls. Additionally, the asset features an extensive range of process-monitoring tools, including process temperature control, plasma emission monitoring, vacuum pressure monitoring, and particle-counting capabilities. Overall, the Minos Poly is a reliable and robust model that provides precise etching capabilities for a variety of substrates. This plasma etch reactor is well-suited for high volume production, R&D, and testing applications in industries such as electronics packaging, PCB manufacturing, and semiconductor device fabrication.