Used AMAT / APPLIED MATERIALS Centura AP eMax CT #293669649 for sale

AMAT / APPLIED MATERIALS Centura AP eMax CT reactor is an advanced etch and deposition equipment for semiconductor technology. The system is a modular, industrial-grade platform designed to offer high throughput and high precision applications for a range of processing requirements. AMAT Centura AP eMax CT reactor features a large, controlled-temperature, hot-wall vapor-phase chamber. This chamber holds up to 500 wafers and can reach temperatures up to 500°C. The chamber has a low-oxidation environment and tight temperature gradient range, making it ideal for advanced nanoscale feature deposition and etching processes. The unit utilizes a multi-zone particle filter to minimize particulate contamination, able to regulate particles up to 0.5 microns in size. The reactor also features individual source and exhaust zones with their own set power, pressure, and temperature to ensure accurate and precise outcomes with each process cycle. The reactor is equipped with a range of automated control and diagnostic capabilities, such as remote monitoring and data acquisition. The machine offers real-time process monitoring, enabling users to keep an eye on the process flow and make any necessary adjustments in order to achieve the desired results. And the tool's sensors allow for process optimization with features like overshoots, energy control, pulse duty cycles, and temperature ramps. APPLIED MATERIALS Centura AP eMax CT is capable of uniform and precise large-scale deposition across wafers up to 12" in size. It also offers rapid start-up necessitates shorter cycle times, allowing for more process recipes to run in a single batch process. Plus, it supports a wide range of materials: dielectric layers, reflective layers, masking layers, metal contacts, and molecular gases. Overall, Centura AP eMax CT reactor is an advanced, industrial-grade deposition asset able to accommodate processes across a range of materials and complexities. It is a reliable and efficient choice for producing Nanoscale electronic components, as well as large-scale deposition jobs.