Used AMAT / APPLIED MATERIALS Centura AP eMax CT #9371704 for sale

Name: AMAT / APPLIED MATERIALS Centura AP eMax CT
Brand: AMAT / APPLIED MATERIALS
SKU: 9371704
Availability: SoldOut

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

Tap to zoom

Photo Used AMAT / APPLIED MATERIALS Centura AP eMax CT For Sale

Sold

Reactors

Manufacturer

AMAT / APPLIED MATERIALS

Model

Centura AP eMax CT

ID: 9371704

Wafer Size: 12"

Dielectric etcher, 12" Process: Cu Wafer type: Notch Carrier: FOUP (3) Load ports (4) Chambers TDK Corrosion resistant loader module Alcatel IPUP Does not include Hard Disk Drive (HDD) Facility plate: N2 Regulator Manual valve Pressure gauge Loadlock pressure monitor: Gauge convectron: 1MTORR-1000TORR 1 / 4FVCR DNET Transfer pressure monitor: Gauge convectron: 1MTORR-1000TORR 1 / 4FVCR DNET 5 SLM N2 MFC Signal towers: Kit 4 Lights Devicenet light tower Cable: Monitor cable, 15 feet / 50 feet Pump cable, 75 feet Monitors: Monitor 1: Flat panel with keyboard Monitor 2: Remote flat panel Chamber configuration: Process kits: Qt / Si Gas inject: 3.5 Anodized SGD Chamber O-Ring: Chamraz 513 ALCATEL / ADIXEN / PFEIFFER ATH 1600M Turbo pump RF Match: DAIHEN RF Generator: ENI GHW 50 EPD Windows: Quick remove released quartz CM Test port: 1/2 VCR and KF25 Dual RGA Port: RGA port Endpoint type: H.O.T Endpoint Endpoint wavelength 1: CO 484 NM Endpoint wavelength 2: CN 387 NM Cathode temperature monitor ESC Power supply: CT HV RF Feed: Direct CT Cathode Dry pump: EABARA-ESR80WN Wall chiller: SMC-H2010 Cathode chiller: SMC-INR 496-003D Coolant: HT110 ESC type: ESC, Assembly, 12" , Dual electrode, IA Liner: CT Liner Process gas box configuration: Chamber A: Gas name / MFC Type size NF3 / FC-PN980CR1BA-100 CH3F / FC-PN980CR1BA-50 CH2F2 / FC-PN980CR1BA-50 O2 2000 / FC-PN980CR1BA-2000 O2 50 / FC-PN980CR1BA-50 O2 20 / FC-PN980CR1BA-20 N2 / FC-PN980CR1BA-200 CHF3 / FC-PN980CR1BA-200 CF4 / FC-PN980CR1BA-200 AR 300 / FC-DN780C-BA-300 Chamber B: Gas name / MFC Type size C4F6 / FC-PN980CR1BA-150 C4F8 / FC-PN980CR1BA-50 CO / FC-PN980CR1BA-500 CH2F2 / FC-PN980CR1BA-50 O2 2000 / FC-PN980CR1BA-2000 O2 50 / FC-PN980CR1BA-50 N2 / FC-PN980CR1BA-200 CHF3 / FC-PN980CR1BA-200 CF4 / FC-DN780C-BA-200 AR 300 / FC-DN780C-BA-300 Chamber C: Gas name / MFC Type size C4F6 / FC-PN980CR1BA-150 CH2F2 / FC-PN980CR1BA-50 O2 2000 / FC-PN980CR1BA-2000 O2 50 / FC-PN980CR1BA-50 O2 20 / FC-PN980CR1BA-20 N2 / FC-PN980CR1BA-200 CHF3 / FC-PN980CR1BA-200 CF4 / FC-DN780C-BA-200 AR 200 / FC-PN980CR1BA-200 AR 1500 / FC-PN980CR1BA-1500 Chamber D: Gas name / MFC Type size C4F6 / FC-PN980CR1BA-150 CH2F2 / FC-PN980CR1BA-50 O2 2000 / FC-PN980CR1BA-2000 O2 50 / FC-PN980CR1BA-50 N2 / FC-PN980CR1BA-200 CHF3 / FC-PN980CR1BA-200 CF4 / FC-PN980CR1BA-200 AR 200 / FC-PN980CR1BA-200 AR 1500 / FC-PN980CR1BA-1500.

Read More Close

AMAT / APPLIED MATERIALS Centura AP eMax CT is a specialized reactor designed for photoresist processing. This ultra-fast thermal processing reactor is an advanced tool designed to enable users to benefit from faster etching cycles, precise temperature controls, and accurate thermal measurement. The tap water cooling equipment of AMAT Centura AP eMax CT enables minimal thermal spread within the chemical etching chamber, thus providing high-precision control over wafer temperature during etching. With the help of an advanced Closed-Loop Feedback Control System, users are able to maintain uniform temperatures and process durations precisely as prescribed. This ensures that the wafers are not exposed to any unexpected fluctuations in temperature that could cause thermal damage to the sensitive materials they are processing. APPLIED MATERIALS Centura AP eMax CT is also equipped with an advanced Pulsed Excimer Source that reduces noxious out-gassing and minimizes the generation of undesirable byproducts. This feature helps to ensure that the etching process remains consistent and predictable. The source also features a unidirectional air-flow and a rapid wafer transfer unit to help minimize particle counts and reduce downtime related to cleaning. In addition to its advanced technological capabilities, Centura AP eMax CT is also designed to meet the highest safety standards. Its robust safety monitoring machine is capable of continuously monitoring the etching process and is able to detect the presence of hazardous leaks. This ensures that the reactor is able to function safely and reliably. AMAT / APPLIED MATERIALS Centura AP eMax CT is an advanced etching reactor that provides users with reliable, high-precision control of their etching cycles. Its powerful features help to minimize thermal spread and reduce outgassing and particle count. Its safety monitoring tool ensures that the etching is monitored continuously and enables users to take advantage of a reliable, safe, and efficient photoresist etching solution.