Used AMAT / APPLIED MATERIALS Centura AP Enabler FEOL-E5 #9119010 for sale
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ID: 9119010
Wafer Size: 12"
Vintage: 2009
Dielectric etcher, 12"
(4) Chambers
Parts system
2009 vintage.
AMAT (APPLIED MATERIALS) Centura AP Enabler Front End of Line (FEOL)-E5 is a semiconductor manufacturing equipment that provides an advanced platform for the fabrication of nano-scale integrated circuits. It offers a unique blend of features that allow for excellent production efficiency and reliability. The AP Enabler FEOL-E5 utilizes an innovative Feature Enhanced Organic Layer (FEOL) technology, which provides an excellent interface between the silicon substrate and the deposited layer. The FEOL process allows for highly advanced feature control and precision in the lithography process. The integrated lithography system supports up to 14nm linewidths, allowing for the fabrication of the most advanced electronic components. The unit also features a high-power, high-reliability vacuum disk sputtering machine, providing superior uniformity in the deposition process. The tool can be configured to handle a wide range of materials, including metals, ceramics, and polysilicon layers. This offers increased flexibility and the ability to handle a wide range of applications, from complex memory chips to nanometer scale power devices. In addition to the innovative FEOL technology, the asset offers an integrated heating model and innovative process control electronics to ensure reliable operation and uniformity across the wafer substrate. The equipment supports a high-resolution metrology system for accurate monitoring of the deposition process and the subsequent dielectric deposition process. The AP Enabler FEOL-E5 is a high-end unit that offers superior process control, high up-time, and reliable operation. It delivers excellent yields and improved device performance, making it ideal for advanced semiconductor production. With its wide range of features and high-reliability design, AMAT / APPLIED MATERIALS Centura AP Enabler FEOL-E5 is the perfect choice for advanced semiconductor manufacturing.
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