Used AMAT / APPLIED MATERIALS Centura AP Frame #9293610 for sale

AMAT Centura AP Reactor is a chemical vapor deposition (CVD) equipment designed for use in the semiconductor industry. It is a single-wafer tool that can be configured to create either thick film or ultra-thin film deposition on a variety of dielectric and metal substrates. The system uses a unique and innovative process-chamber design, allowing for higher yields and better uniformity. Its easily adjustable substrate holders offer a wide range of process parameters, resulting in higher production efficiency. The Centura AP Reactor comes equipped with a universal heating unit that permits the deposition of a wide array of materials, including Silicon-3 (Si3), Silicon carbide (SiC) and Titanium dioxide (TiO2). Its multi-station capability and high-temperature operation make the Centura AP ideal for a variety of low-k and advanced dielectric applications. The machine also features a proprietary CVD tool that yields high-quality films with even thicknesses in all areas of the substrate. The tool also utilizes a high gas-flow-rate asset that is said to significantly decrease bath entrapment. By controlling reactions with higher process temperatures, the model can further reduce metal diffusion. The high temperatures also maximize throughput and reduce particle counts. On top of that, the effective wafer cooling equipment of the Centura AP Reactor quickly and evenly cools the wafer both inside the chamber and outside the chamber. The AP Reactor's advanced controller offers excellent flexibility and ease-of-use. It supports complex recipes, with up to 8 material sources and 10 process parameters, allowing engineers to quickly adapt the tool to different recipes and deposition rates. The master computer enables easy recipe setup, advanced process monitoring, and alarm messaging. Additionally, it also gives users in-depth data on film characterization and a powerful substrate control module, which allows operators to precisely control the positioning of the substrate during acquisitions or cool down times. Moreover, the Centura AP Reactor provides enhanced safety features. It includes a safety pen that alerts operators if too much material is being added, an auto-shut-off feature if the chamber pressure is too low, and other measures to ensure a safe and effective operation. As a final touch, the system also comes with easy maintenance options, allowing for quick and easy cleaning and servicing. Overall, APPLIED MATERIALS Centura AP Reactor is an advanced and reliable CVD tool for any semiconductor producer that requires highly efficient and uniform depositions. It offers maximum process control, unit flexibility and enhanced safety features, all at an affordable price, making it the ideal tool for any CVD application.