Used AMAT / APPLIED MATERIALS Centura AP Ultima X #9149535 for sale

AMAT / APPLIED MATERIALS Centura AP Ultima X is a plasma enhanced chemical vapor deposition (PECVD) reactor. It provides advanced performance for rapid, reliable and repeatable manufacturing of advanced II-VI and III-V semiconductor films. The Ultima X is capable of producing high-purity, highly-stressed, and low-defect films for even the most challenging device fabrication requirements. The Ultima X reactor features a wall-less (self-annealing) PECVD chamber, and a traditional flue showerhead showerhead, which enable the growth of a wide range of conformal films with a low degree of temperature non-uniformity. In addition, it offers variable pressure and temperature control of the process gas in the showerhead. The source power supplies provide linear adjustment of RF power to the showerhead, and a wide range of plasma frequency options up to 200 MHz. This allows for excellent fill factor and critical dimension uniformity. The Ultima X also features advanced heating zone technology with fast ramp-up and ramp-down rates. This helps to reduce stress and prevent contamination while controlling the final film properties. The reactor's advanced quartz showerhead and substrate holder ensure high temperature uniformity and superior film characteristics. The high temperature uniformity ensures excellent material transfer repeatability and provides better step coverage than conventional showerhead designs. The durable quartz composition of AMAT Centura AP Ultima X makes it suitable for difficult and temperature-sensitive depositions. The Ultima X has been designed for increased yield and throughput. It is capable of delivering standard and non-standard process recipes. The integrated control system updates processes in real-time, allowing for rapid optimization of devices. Parameters such as wafer temperature, chamber pressure, RF source, and gas flow are monitored conditions and controlled automatically. APPLIED MATERIALS Centura AP Ultima X reactor is ideal for prototyping, development, and high-volume production of high-performance electronic components. Its advanced performance enables users to rapidly develop, test, and iterate to deliver far superior products. Its optimized design and high temperature uniformity ensure repeatable and reliable results.